IP Library Patent Application 60518865
Patent Application Provisional Small
App. No. 60/518,865 · Confirmation No. 3334

Method and system for inline process monitoring of etching uniformity across a wafer

Inventor: Jack Jau
Provisional Application Expired
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Code Description Pages PDF
2003-11-10 TRNA Transmittal of New Application 1 View
2003-11-10 SPEC Specification 8 View
2003-11-10 ADS Application Data Sheet 3 View
2003-11-10 ARTIFACT Artifact sheet indicating an item has been filed which cannot be scanned 1 View
2003-11-10 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/518,865
Filed
2003-11-10