Patent Application
Provisional
App. No. 60/603,560
· Confirmation No. 3966
Method of model based scattering bars for enhanced depth of focus quarter-wavelength lithography
Provisional Application Expired
Inventors
Douglas Van Den Broeke
Sunnyvale, CA
Jang Fung Chen
Cupertino, CA
Attorneys & Agents of Record
Prosecution
- Docket No.
- 55071-391
- Confirmation No.
- 3966
from
ASML MASKTOOLS B.V.
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2014-02-07
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
- App. No.
- 60/603,560
- Filed
- 2004-08-24
External Links