IP Library › Patent Application 60666385
Patent Application Provisional Small
App. No. 60/666,385 · Confirmation No. 9537

System and method for introducing deliberate nonuniformity of integrated-circuit transistor gate dimensions to reduce leakage currents

Provisional Application Expired
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 Code Description Pages PDF
2021-06-07 OATH Oath or Declaration filed 53 View
2005-03-30 TRNA Transmittal of New Application 2 View
2005-03-30 SPEC Specification 7 View
2005-03-30 CLM Claims 1 View
2005-03-30 DRW Drawings-only black and white line drawings 3 View
2005-03-30 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/666,385
Filed
2005-03-30