IP Library › Patent Application 60840953
Patent Application Provisional
App. No. 60/840,953 · Confirmation No. 1970

Method for empirical modeling of resist development and pattern etch effects in photolithography

Inventor: Edita Tejnil
Provisional Application Expired
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 Code Description Pages PDF
2006-08-30 TRNA Transmittal of New Application 1 View
2006-08-30 SPEC Specification 5 View
2006-08-30 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/840,953
Filed
2006-08-30