IP Library › Patent Application 60857495
Patent Application Provisional
App. No. 60/857,495 · Confirmation No. 5399

Empirical predictions of line width roughness and resist pattern failure and their incorporation in a photolithographic simulator

Inventor: Steve Hansen
Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2007-03-06 APP.FILE.REC Filing Receipt 3 View
2007-02-21 CFILE Request for Corrected Filing Receipt 5 View
2006-11-24 APP.FILE.REC Filing Receipt 3 View
2006-11-08 TRNA Transmittal of New Application 1 View
2006-11-08 SPEC Specification 7 View
2006-11-08 DRW Drawings-only black and white line drawings 16 View
2006-11-08 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/857,495
Filed
2006-11-08