Process for the synthesis of oligomeric compounds
Synthetic processes are provided wherein oligomeric compounds are prepared having phosphodiester, phosphorothioate, phosphorodithioate, or other covalent linkages. The oligomers have substantially reduced exocyclic adducts deriving from acrylonitrile or related contaminants.
1. A method for deprotecting a phosphate-linked oligonucleotide, said oligonucleotide having a plurality of protected phosphorus linkages of formula:
wherein:
each X is O or S;
R t is a phosphorus protecting group of the formula:
—C(R 10 ) 2 —C(R 10 ) 2 —W or —C(R 10 ) 2 —(CH═CH) P —C(R 10 ) 2 —W
each R 10 is independently H or lower alkyl;
W is an electron withdrawing group;
p is 1 or 3;
comprising:
providing a sample containing a plurality of said phosphate linked oligonucleotides; and
contacting said oligonucleotides with a deprotecting reagent for a time and under conditions sufficient to remove substantially all of said R 1 groups from said oligonucleotides to form a plurality of deprotected oligomers, said deprotecting reagent containing at least one aliphatic amine, the conjugate acid of said amine having a pKa of from about 8 to about 11, said deprotecting reagent further comprises a scavenger, wherein said scavenger is a purine, a pyrimidine, inosine, a pyrrole, an imidazole, a triazole, a mercaptam, a beta amino thiol, a phosphine, a phosphite, a diene, urea, a thiourea, an amide, an imide, a cyclic imide, a ketone, a polymer having free thiol groups, or a polymer having free amino groups; said deprotecting reagent optionally further comprising one or more solvents selected from the group consisting of aliphatic, haloaliphatic, cyanoaliphatic, aromatic and alkylaromatic solvents.
2. The method of claim 1 further comprising a washing step.
3. The method of claim 1 wherein said oligonucleotides are in solution.
4. The method of claim 1 wherein said oligonucleotides are linked to a solid support.
5. The method of claim 4 wherein said deprotected oligomers remain attached to said solid support after contacting with said deprotecting reagent.
6. The method of claim 5 wherein said deprotecting reagent comprises an aliphatic amine.
7. The method of claim 5 wherein said deprotecting reagent comprises a haloaliphatic solvent or a cyanoaliphatic solvent.
8. The method of claim 7 wherein said aliphatic amine is triethylamine or piperidine and said solvent is acetonitrile or methylene chloride.
9. The method of claim 1 wherein said phosphorus protecting group is —CH 2 —CH 2 C≡N or —CH 2 —(CH═CH) p —CH 2 —C≡N, where p is an integer from 1 to 3.
10. The method of claim 9 wherein said phosphorus protecting group is —CH 2 —CH 2 —C≡N.
11. The method of claim 1 , wherein said deprotecting reagent further comprises a scavenger, wherein said scavenger is an alkylmercaptan, thiol 4-methoxytrityl resin, thiol 2-chlorotrityl resin, ethylene glycol, substituted ethylene glycol, 1-butanethiol, S-(2-amino-4-thiazolylmethyl)isothiourea hydrochloride, 2-mercaptoethanol, 3,4-dichlorobenzylamine, benzylamine, benzylamine in the presence of carbon disulfide, hydroxylamine, 2-phenylindole, n-butylamine, diethyl ester of acetaminomalonic acid, ethyl ester of N-acetyl-2-cyanoglycine, 3-phenyl-4-(o-fluorophenyl)-2-butanone, 3,4-diphenyl-2-butanone, desoxybenzoin, p-sulfobenzenediazonium chloride, p-sulfamidobenzenediazonium chloride, or a polymer bound amine resin wherein the amine is selected from the group consisting of benzylamine, ethylenediamine, diethylamine triamine, tris(2-aminoethyl)amine, methylamine, methylguanidine, polylysine, oligolysine, aminomethyl polystyrene-co-divinyl high-load resin, and aminomethyl polystyrene-co-divinylbenzene low-load resin.
12. The method of claim 1 wherein said deprotected oligonucleotides have from about 0.001% to about 1% nucleobase-acrylonitrile adduct.
13. The method of claim 1 wherein said deprotected oligonucleotides have from about 0.1% to about 1% nucleobase-acrylonitrile adduct.
14. The method of claim 1 wherein said deprotected oligonucleotides have from about 0.1% to about 0.75% nucleobase-acrylonitrile adduct.
15. The method of claim 1 wherein said deprotected oligonucleotides have from about 0.1% to about 0.5% nucleobase-acrylonitrile adduct.
16. The method of claim 1 wherein said deprotected oligonucleotides are substantially free of detectable nucleobase-acrylonitrile adduct.
17. The method of claim 1 wherein said aliphatic amine is triethylamine or piperidine; said solvent is acetonitrile or methylene chloride; and said phosphorus protecting group is —CH 2 —CH 2 —C≡N.
18. A method for deprotecting a phosphate-linked oligonucleotide, said oligonucleotide having a plurality of protected phosphorus linkages of formula:
wherein:
each X is O or S;
R t is a phosphorus protecting group of the formula:
—C(R 10 ) 2 —C(R 10 ) 2 —W or —C(R 10 ) 2 —(CH═CH) P —C(R 10 ) 2 —W
each R 10 is independently H or lower alkyl;
W is an electron withdrawing group;
p is 1 to 3;
comprising
providing a sample containing a plurality of said phosphate linked oligonucleotides;
contacting said oligonucleotides with a deprotecting reagent for a time and under conditions sufficient to remove substantially all of said R t groups from said oligonucleotides to form a plurality of deprotected oligonucleotides, said deprotecting reagent further comprises a scavenger, wherein said scavenger is a purine, a pyrimidine, inosine, a pyrrole, an imidazole, a triazole, a mercaptan, a beta amino thiol, a phosphine, a phosphite, a diene, urea, a thiourea, an amide, an imide, a cyclic imide, a ketone, a polymer having free thiol groups, or a polymer having free amino groups; and
washing said deprotected oligonucleotides with a washing reagent comprising at least one aliphatic amine, the conjugate acid of said amine having a pKa of from about 8 to about 11; said washing reagent optionally further comprising one or more solvents selected from the group consisting of aliphatic, haloaliphatic, cyanoaliphatic, aromatic and alkylaromatic solvents.
19. The method of claim 18 wherein said oligonucleotides are in solution.
20. The method of claim 18 wherein said oligonucleotides are linked to a solid support.
21. The method of claim 20 wherein said deprotected oligonucleotides remain attached to said solid support after contacting with said deprotecting reagent.
22. The method of claim 18 wherein said deprotecting reagent comprises an aliphatic amine.
23. The method of claim 21 wherein said washing reagent comprises a haloaliphatic solvent or a cyanoaliphatic solvent.
24. The method of claim 23 wherein said aliphatic amine is triethylamine or piperidine and said solvent is acetonitrile or methylene chloride.
25. The method of claim 18 wherein said phosphorus protecting group is —CH 2 —CH 2 —C≡N or —CH 2 —(CH═CH) p —CH 2 —C≡N, where p is an integer from 1 to 3.
26. The method of claim 18 wherein said phosphorus protecting group is —CH 2 —CH 2 —C≡N.
27. The method of claim 18 , wherein said deprotecting agent further comprises a scavenger that, is an alkylmercaptan, thiol 4-methoxytrityl resin, thiol 2-chlorotrityl resin, ethylene glycol, substituted ethylene glycol, 1-butanethiol, S-(2-amino-4-thiazolylmethyl)isothiourea hydrochloride, 2-mercaptoethanol, 3,4-dichlorobenzylamine, benzylamine, benzylamine in the presence of carbon disulfide, hydroxylamine, 2-phenylindole, n-butylamine, diethyl ester of acetaminomalonic acid, ethyl ester of N-acetyl-2-cyanoglycine, 3-phenyl-4(o-flurophenyl)-2-butanone, 3,4-diphenyl-2-butanone, desoxybenzoin, p-sulfobenzenediazonium chloride, p-sulfamidobenzenediazonium chloride, or a polymer bound amine resin wherein the amine is selected from the group consisting of benzylamine, ethylenediamine, diethylamine triamine, tris(2-aminoethyl)amine, methylamine, methylguanidine, polylysine, oligolysine, aminomethyl polystyrene-co-divinylbenzene high-load resin, and aminomethyl polystyrene-co-divinylbenzene low-load resin.
28. The method of claim 18 wherein said washing reagent further comprises a scavenger, wherein said scavenger is an alkylmercaptan, thiol 4-methoxytrityl resin, thiol 2-chlorotrityl resin, ethylene glycol, substituted ethylene glycol, 1-butanethiol, S-(2-amino-4-thiazolylmethyl)isothiourea hydrochloride, 2-mercaptoethanol, 3,4-dichlorobenzylamine, benzylamine, benzylamine in the presence of carbon disulfide, hydroxylamine, 2-phenylindole, n-butylamine, diethyl ester of acetaminomalonic acid, ethyl ester of N-acetyl-2-cyanoglycine, 3-phenyl-4-(o-fluorophenyl)-2-butanone, 3,4-diphenyl-2-butanone, desoxybenzoin, p-sulfobenzenediazonium chloride, p-sulfamidobenzenediazonium chloride, or a polymer bound amine resin wherein the amine is selected from the group consisting of benzylamine, ethylenediamine, diethylamine triamine, tris(2-aminoethyl)amine, methylamine, methylguanidine, polylysine, oligolysine, aminomethyl polystyrene-co-divinylbenzene high-load resin, and aminomethyl polystyrene-co-divinylbenzene low-load resin.
29. The method of claim 18 wherein said deprotected oligonucleotides have from about 0.001% to about 1% nucleobase-acrylonitrile adduct.
30. The method of claim 18 wherein said deprotected oligonucleotides have from about 0.1% to about 1% nucleobase-acrylonitrile adduct.
31. The method of claim 18 wherein said deprotected oligonucleotides have from about 0.1% to about 0.75% nucleobase-acrylonitrile adduct.
32. The method of claim 18 wherein said deprotected oligonucleotides have from about 0.1% to about 0.5% nucleobase-acrylonitrile adduct.
33. The method of claim 18 wherein said deprotected oligonucleotides are substantially free of detectable nucleobase-acrylonitrile adduct.
34. The method of claim 18 wherein said aliphatic amine is triethylamine or piperidine; said solvent is acetonitrile or methylene chloride; and said phosphorus protecting group is —CH 2 —CH 2 —C≡N.
35. The method of claim 18 wherein said amine is piperidine, said alkali metal carbonate is potassium carbonate.