Clamshell and small volume chamber with fixed substrate support
Embodiments of the present invention generally relate to a clamshell and small volume chamber with a fixed substrate support. One embodiment of a processing chamber includes a fixed substrate support having a substrate receiving surface, a pumping ring disposed around a perimeter of the substrate receiving surface, and a gas distribution assembly disposed over the fixed substrate support. The pumping ring forms at least a portion of a pumping channel and has one or more apertures formed therethrough. The chamber may further include a gas-flow diffuser disposed radially inward of the apertures of the pumping ring. Another embodiment of a processing chamber includes a first assembly comprising a fixed substrate support and a second assembly comprising a gas distribution assembly. The first assembly includes a first assembly body that is shaped and sized so that at least a portion of the first assembly body is below the substrate receiving surface of the substrate support. A hinge assembly couples the first assembly and the second assembly. The first assembly and the second assembly can be selectively positioned between an open position and a closed position.
1. A processing chamber, comprising:
a first assembly comprising a first assembly body having an upper surface and a fixed substrate support having a substrate receiving surface, wherein the upper surface of the first assembly body is shaped and sized so that at least a portion thereof is below the substrate receiving surface of the substrate support;
a second assembly comprising a gas distribution assembly; and
a hinge assembly coupling the first assembly and the second assembly, wherein the first assembly and the second assembly can be selectively positioned between an open position and a closed position.
2. The processing chamber of claim 1 , wherein the upper surface of the first assembly body is angled.
3. The processing chamber of claim 1 , wherein the portion of the first assembly body below the substrate receiving surface provides access below the substrate support.
4. The processing chamber of claim 1 , wherein a portion of the first assembly body is above the substrate receiving surface.
5. The processing chamber of claim 1 , wherein a portion of the first assembly body is above the substrate receiving surface and forms a first partial sidewall.
6. The processing chamber of claim 5 , wherein the second assembly comprises a second assembly body, a portion of the second assembly body forming a second partial sidewall.
7. The processing chamber of claim 6 , wherein a processing zone is defined between the fixed substrate support, the gas distribution assembly, the first partial sidewall, and the second partial sidewall.
8. The processing chamber of claim 5 , further comprising a slit valve formed in the first partial sidewall of the first assembly body.
9. The processing chamber of claim 1 , further comprising a resistive heating element disposed in the substrate support.
10. A processing chamber, comprising:
a first assembly comprising a first assembly body having an upper surface and a fixed substrate support having a substrate receiving surface, wherein the upper surface of the first assembly body is shaped and sized so that at least a portion thereof is below the substrate receiving surface of the substrate support;
a pumping ring disposed around a perimeter of the substrate receiving surface, the pumping ring forming at least a portion of a pumping channel and having one or more apertures formed therethrough;
a second assembly comprising a gas distribution assembly; and
a hinge assembly coupling the first assembly and the second assembly, wherein the first assembly and the second assembly can be selectively positioned between an open position and a closed position.
11. The processing chamber of claim 10 , wherein the one or more apertures provide fluid communication between the pumping channel and a processing zone between the fixed substrate support and the gas distribution assembly.
12. The processing chamber of claim 10 , wherein the pumping ring is shaped and sized so that the one or more apertures are positioned below a plane defined by the substrate receiving surface.
13. The processing chamber of claim 10 , wherein the apertures are distributed evenly around the pumping ring.
14. The processing chamber of claim 10 , wherein the position of the apertures varies around the pumping ring.
15. The processing chamber of claim 10 , wherein the apertures have uniform size.
16. The processing chamber of claim 10 , wherein the apertures having varying size.
17. The processing chamber of claim 10 , further comprising a gas-flow diffuser disposed between the apertures of the pumping ring and the substrate receiving surface.
18. The processing chamber of claim 17 , wherein the gas-flow diffuser is disposed on the pumping ring.
19. The processing chamber of claim 17 , wherein the gas-flow diffuser extends partially around the perimeter of the substrate receiving surface.
20. The processing chamber of claim 17 , wherein the gas-flow diffuser extends entirely around the perimeter of the substrate receiving surface.
21. The processing chamber of claim 17 , wherein the gas-flow diffuser has different heights.
22. The processing chamber of claim 17 , wherein the gas-flow diffuser is tapered.
23. The processing chamber of claim 17 , wherein the gas-flow diffuser has a uniform height.
24. The processing chamber of claim 10 , further comprising a gap between the substrate support and the pumping channel.
25. The processing chamber of claim 24 , further comprising a gas port below the substrate support, the gas port adapted to provided a bottom purge gas through the gap between the substrate support and the pumping channel.
26. The processing chamber of claim 10 , wherein the spacing between the substrate support and the gas distribution assembly is about 0.75 inches or less.
27. The processing chamber of claim 10 , further comprising a resistive heating element disposed in the substrate support.