IP Library › Granted Patent US 6,872,944
Granted Patent B2
US 6,872,944 · App. 10/699,793 · Granted Mar 29, 2005

Scanning electron microscope

Assignee: Hitachi, Ltd.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,872,944
App. No.
10/699,793
Granted
Mar 29, 2005
Kind
B2
Abstract

The present invention relates to a scanning electron microscope employing a deceleration field forming technology (retarding), more particularly a scanning electron microscope which separates and detects secondary electrons at high efficiency. The object of the present invention is accomplished by providing an electron source, a lens for condensing the primary electron beam which is emitted from said electron source, a detector for detecting electrons which are generated by radiation of the primary electron beam onto a specimen, a first deceleration means for decelerating the primary electron beam which is radiated onto said specimen, a second deceleration means for decelerating electrons which are generated on the specimen, and a deflector for deflecting said electrons which are decelerated by said second decelerating means.

Claims (20)

1. A specimen observing method, comprising the steps of:

irradiating a specimen supplied with a negative voltage with an electron beam to generate secondary electrons from the specimen,

forming a negative potential field such that the secondary electrons are retarded,

deflecting and detecting the retarded secondary electrons to obtain a specimen image on the basis of the retarded secondary electrons, and

adjusting the negative voltage so as to cancel charge-up of the specimen.

2. A specimen observing method according to claim 1 , wherein the step of adjusting the negative voltage is so performed that the specimen image has a given image contrast.

3. A specimen observing method according to claim 1 , wherein the step of adjusting the voltage is performed while monitoring an output of a secondary electron detector detecting the generated secondary electrons so that the output shows a maximum.

4. A specimen observing method, comprising the steps of:

irradiating a specimen supplied with a negative voltage with an electron beam to generate secondary electrons from the specimen,

forming a negative potential field such that the secondary electrons are retarded,

deflecting and detecting the retarded secondary electrons to obtain a specimen image on the basis of the retarded secondary electrons, and

adjusting the negative voltage while monitoring an output of a secondary electron detector detecting the secondary electrons to determine a value of the negative voltage at which the output has a maximum value.

5. A scanning electron microscope which comprises:

an electron source emitting a primary electron beam,

a focusing lens focusing the primary electron beam,

a deflector deflecting the primary electron beam to irradiate a specimen with the focused primary electron beam so as to generate secondary electrons from the specimen;

a detector detecting the secondary electrons;

a negative voltage supplying source supplying the specimen and the deflector with a negative voltage such that the secondary electrons are retarded, and

a controller adjusting the negative voltage to determine a value thereof at which the output shows a maximum.

6. A scanning electron microscope according to claim 5 , wherein the secondary electron detector comprises a secondary electron multiplier and the controller adjusts the negative voltage while monitoring an output of the secondary electron multiplier.

Priority Claims (3)
JP 10-056417 · Mar 9, 1998 · national
JP 10-259679 · Sep 14, 1998 · national
JP 10-259681 · Sep 14, 1998 · national
Continuity (2)
Continuation 0948604200
Related Publication 20040089805A1 · May 13, 2004