Method of removing organic materials using aqueous cleaning solutions
Removal of water-insoluble organic residues from inorganic surfaces can be accomplished in aqueous cleaning solutions containing an oxidant at a preselected temperature wherein the pH is adjusted with respect to the isoelectric point of the surface material to be removed so that the pH is above the pK, and the isoelectric point of the surface for acid materials, and below the PKa and the isoelectric point of the surface for basic materials. Surfactants can also be added to the cleaning solution.
1. A method of removing water-insoluble organic material from an norganic surface coated with the water-insoluble organic material in pharmaceutical manufacturing equipment, the method comprising the following steps in sequence:
(a) contacting said inorganic surface in pharmaceutical processing equipment with an aqueous solution containing about 4.5 to about 15% by weight of hydrogen peroxide and a hydroxide in an amount so as to obtain a pH of above 7;
(b) agitating said aqueous solution onto said surface until said organic material is loosened from the inorganic surface at a temperature of from about 40 to about 100° C., forming organic residue in said aqueous solution; and
(c) rinsing away the organic residue; wherein the organic material includes a water insoluble cycloketone.
2. A method according to claim 1 wherein said surface is selected from the group consisting of a glass, a ceramic, a metal and a metal oxide.
3. A method according to claim 1 wherein said organic material includes a water insoluble polymer.
4. A method according to claim 1 wherein said organic material includes a water insoluble resin.
5. A method according to claim 1 wherein said organic material includes a silicone grease.
6. A method according to claim 1 wherein said organic material includes a water insoluble organic acid.
7. A method of removing water-insoluble organic material from an inorganic surface coated with the water-insoluble organic material in pharmaceutical manufacturing equipment, the method comprising:
(a) contacting said surface in pharmaceutical processing equipment in an aqueous solution containing about 4.5 to about 15% by weight of hydrogen peroxide and an acid in an amount so as to obtain an acidic pH;
(b) agitating said aqueous solution against said surface until said organic material is loosened from the inorganic surface at a temperature of from about 40 to about 100° C., forming organic residue in said aqueous solution; and
(c) rinsing away the organic residue.
8. A method according to claim 7 wherein said organic material includes a water insoluble organic amine.
9. A method of removing water-insoluble organic material from an inorganic surface coated with the water-insoluble organic material, the method comprising the following steps in sequence:
(a) contacting said inorganic surface with an aqueous solution containing about 4.5 to about 15% by weight of hydrogen peroxide and a hydroxide in an amount so as to obtain a pH of above 7;
(b) agitating said aqueous solution onto said surface until said organic-material is loosened from the inorganic surface at a temperature of from about 40 to about 100° C., forming organic residue in said aqueous solution, and wherein said organic material includes a water insoluble cycloketone; and
(c) rinsing away the organic residue.
10. A method of removing water-insoluble organic material from an inorganic surface.coated with the water-insoluble organic material, the method comprising the following steps in sequence:
(a) contacting said inorganic surface with an aqueous solution containing about 4.5 to about 15% by weight of hydrogen peroxide and a hydroxide in an amount so as to obtain a pH of about 7;
(b) agitating said aqueous solution onto said surface until said organic material is loosened from the inorganic surface at a temperature of from about 40 to about 100° C., forming organic residue in said aqueous solution, and wherein said organic material includes water insoluble cellulose; and
(c) rinsing away the organic residue.
11. A method of preparing a clean surface from an inorganic surface coated with a water-insoluble organic material consisting essentially of the following steps in sequence:
(a) contacting said inorganic surface with an aqueous solution consisting essentially of about 4.5 to about 15% by weight of hydrogen peroxide and a hydroxide in an amount so as to obtain a pH of above 7;
(b) agitating said solution onto said surface until said organic material is loosened from the inorganic surface at a temperature of from about 20 to about 100° C., forming detached particles in said aqueous solution, and (c) rinsing away the detached organic particles; wherein said organic material includes water insoluble cellulose.
12. A method according to claim 11 wherein said surface is selected from the group consisting of a glass, a ceramic, a metal and a metal oxide.