Thermal management components

1. A method for cooling a semiconductor device having a thermal transfer surface area comprising:

growing a diamond film on a substrate in a deposition chamber by reacting gases suitable for diamond deposition in a plasma ignited in said deposition chamber, said plasma disposed adjacent to a growth surface of said substrate such that said plasma extends no further than about 5 mm from said growth surface of said substrate;

removing said diamond film from said substrate; and

thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device.

2. The method of claim 1 wherein growing said diamond film comprises growing a diamond film having an area larger than said thermal transfer surface area of the semiconductor device and further including:

dividing said diamond film into portions, at least one portion having an area matched to the thermal transfer area of the semiconductor device; and

wherein thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises thermally coupling a first surface of said at least one portion of said diamond film to said thermal transfer surface area of the semiconductor device.

3. The method of claim 1 further including thermally coupling a second surface of said diamond film to a heat sink.

4. The method of claim 1 wherein thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises mechanically bonding said first surface of said diamond film to said thermal transfer surface area of said semiconductor device with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

5. The method of claim 4 further including mechanically bonding a second surface of said diamond film to a heat sink with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

6. The method of claim 1 wherein thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises maintaining said first surface of said diamond film and said to said thermal transfer surface area of said semiconductor device in compression against one another.

7. The method of claim 6 further including maintaining a heat sink in compression with a second surface of said diamond film.

8. A method for cooling a semiconductor device having a thermal transfer surface area comprising:

growing a diamond film on a substrate in a deposition chamber, said diamond film characterized by a composite growth efficiency greater than about 0.003;

removing said diamond film from said substrate; and

thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device.

9. The method of claim 8 wherein growing said diamond film comprises growing a diamond film having an area larger than said thermal transfer surface area of the semiconductor device and further including:

dividing said diamond film into portions, at least one portion having an area matched to the thermal transfer area of the semiconductor device; and

wherein said thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises thermally coupling a first surface of said at least one portion of said diamond film to said thermal transfer surface area of the semiconductor device.

10. The method of claim 8 further including thermally coupling a second surface of said diamond film to a heat sink.

11. The method of claim 8 wherein thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises mechanically bonding said first surface of said diamond film to said thermal transfer surface area of said semiconductor device with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

12. The method of claim 11 further including mechanically bonding a second surface of said diamond film to a heat sink with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

13. The method of claim 8 wherein said thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises maintaining said first surface of said diamond film and said thermal transfer surface area of said semiconductor device in compression against one another.

14. The method of claim 13 further including maintaining a heat sink in compression with a second surface of said diamond film.

15. A method for cooling a semiconductor device having a thermal transfer surface area comprising:

growing a diamond film on a substrate in a deposition chamber by reacting gases suitable for diamond deposition in a plasma ignited with energy at a frequency greater than 50 MHz and a power of at least 50 watts at a powered electrode in said deposition chamber, said gases maintained at a pressure greater than 20 Torr, said substrate maintained at a temperature greater than about 700° C.;

removing said diamond film from said substrate; and

thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device.

16. The method of claim 15 wherein said growing said diamond film comprises growing a diamond film having an area larger than said thermal transfer surface area of the semiconductor device and further including:

dividing said diamond film into portions, at least one portion having an area matched to the thermal transfer area of the semiconductor device; and

wherein said thermally coupling a first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises thermally coupling a first surface of said at least one portion of said diamond film to said thermal transfer surface area of the semiconductor device.

17. The method of claim 15 further including thermally coupling a second surface of said diamond film to a heat sink.

18. The method of claim 15 wherein said thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises mechanically bonding said first surface of said diamond film to said thermal transfer surface area of said semiconductor device with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

19. The method of claim 18 further including mechanically bonding a second surface of said diamond film to a heat sink with a bonding material having a thermal conductivity greater than 0.1 W/cm/° K.

20. The method of claim 15 wherein thermally coupling said first surface of said diamond film to said thermal transfer surface area of the semiconductor device comprises maintaining said first surface of said diamond film and said to said thermal transfer surface area of said semiconductor device in compression against one another.

21. The method of claim 20 further including maintaining a heat sink in compression with a second surface of said diamond film.