Fabrication of true apodized fiber Bragg grating using a new two-beam interferometer with polarization control
The present invention provides a two-beam interference exposure system that can be simply adjusted by rotating only one mirror. By placing a half-wave plate in one of the interference arms and precisely scanning the relative fiber position, the present invention can expose true apodized fiber Bragg gratings in a single scan by simultaneously rotating the angle of the half-wave plate. By rotationally switching the fast and slow axes of the half-wave plate, the present invention can also expose n-phase-shifted fiber grating by the same system.
1. An exposure system for forming a grating on a photosensitive fiber, the exposure system comprising:
a light source, for generating a light beam;
a rotating reflection mirror, for rotating around a pre-determined position as to enable the light beam to be reflected into a first direction after irradiating the rotating reflection mirror;
a beam splitter, for splitting the light beam with a pre-determined incident angle into a first split light beam and a second split light beam, both of which share the same intensity;
a first fixed reflection mirror, fixed on a first pre-determined position so that the first split light beam is reflected into a second direction after it is irradiated on the first fixed reflection mirror;
a second fixed reflection mirror, fixed on a second pre-determined position so that the second split light beam is reflected into a third direction after it is irradiated on the second fixed reflection mirror; and
a half-wave plate module, installed facing the third direction as to convert the second split light beam into a light beam with pre-determined polarization;
wherein an interference fringe appears where the first split light beam and the light beam with pre-determined polarization intersect such that the grating is formed in the photosensitive fiber according to the interference fringe.
2. The exposure system as recited in claim 1 , wherein the half-wave plate module comprises a half-wave plate as to enable the reflected second split light beam to be polarized with a pre-determined polarization direction.
3. The exposure system as recited in claim 2 , wherein the half-wave plate module further comprises a rotating base as to carry the half-wave plate such that the half-wave plate rotates around a pre-determined position as to enable the reflected second split light beam to pass through the half-wave plate and be polarized with the pre-determined polarization direction.
4. The exposure system as recited in claim 1 , wherein the photosensitive fiber is disposed on a movable base such that the photosensitive fiber is continuously exposed.
5. The exposure system as recited in claim 1 , wherein the rotating reflection mirror includes a refection mirror and a rotating base, the refection mirror installed on the rotating base such that the reflection mirror rotates around a pre-determined position as to enable the light beam to be reflected into the first direction after irradiating the reflection mirror.
6. The exposure system as recited in claim 1 , wherein the light source is a UV light source and the light beam is a UV light beam.
7. An exposure method for forming a grating on a photosensitive fiber, the exposure method comprising steps of:
providing a light source, for generating a light beam;
providing a rotating reflection mirror, for rotating around a pre-determined position as to enable the light beam to be reflected into a first direction after irradiating the rotating reflection mirror;
providing a beam splitter, for splitting the light beam with a pre-determined incident angle into a first split light beam and a second split light beam, both of which share the same intensity;
providing a first fixed reflection mirror, fixed on a first pre-determined position so that the first split light beam is reflected into a second direction after it is irradiated on the first fixed reflection mirror;
providing a second fixed reflection mirror, fixed on a second pre-determined position so that the second split light beam is reflected into a third direction after it is irradiated on the second fixed reflection mirror; and
providing a half-wave plate module, installed facing the third direction as to convert the second split light beam into a light beam with pre-determined polarization;
wherein an interference fringe appears where the first split light beam and the light beam with pre-determined polarization intersect such that the grating is formed in the photosensitive fiber according to the interference fringe.
8. The exposure method as recited in claim 7 , wherein the half-wave plate module comprises a half-wave plate as to enable the reflected second split light beam to be polarized with a pre-determined polarization direction.
9. The exposure method as recited in claim 8 , wherein the half-wave plate module further comprises a rotating base as to carry the half-wave plate such that the half-wave plate rotates around a pre-determined position as to enable the reflected second split light beam to pass through the half-wave plate and be polarized with the pre-determined polarization direction.
10. The exposure method as recited in claim 7 , wherein the photosensitive fiber is disposed on a movable base such that the photosensitive fiber is continuously exposed.
11. The exposure method as recited in claim 7 , wherein the rotating reflection mirror includes a refection mirror and a rotating base, the refection mirror installed on the rotating base such that the reflection mirror rotates around a pre-determined position as to enable the light beam to be reflected into the first direction after irradiating the reflection mirror.
12. The exposure method as recited in claim 7 , wherein the light source is a UV light source and the light beam is a UV light beam.