mark position detecting apparatus
A mark position detecting apparatus includes: an illuminating unit that illuminates a mark on a substrate; an image forming optical system that forms an image of the mark with light from the mark; an adjustment unit that adjusts distortion manifesting at the image forming optical system; an image capturing unit that captures the image of the mark formed by the image forming optical system in which the distortion has been adjusted and outputs image signals; and a calculation unit that calculates a substantial central position of the mark based upon the image signals output by the image capturing unit.
1. A mark position detecting apparatus comprising:
an illuminating unit that illuminates a plurality of marks on a substrate using a single illuminating optical system;
an image forming optical system that forms images of the plurality of marks with light from the marks;
an image capturing unit that captures the images of the plurality of marks and outputs image signals;
a measurement unit that measures a distribution state of distortion manifesting at the image forming optical system by using the image signals input from the image capturing unit;
an adjustment unit that adjusts the distortion manifesting at the image forming optical system based upon the distribution state of the distortion; and
a calculation unit that calculates relative positions between the plurality of marks by using the image signals input from the image capturing unit.
2. A mark position detecting apparatus according to claim 1 , wherein:
the adjustment unit comprises an optical element tilt supporting unit that supports an optical element constituting at least part of the image forming optical system so as to allow an optical axis of the optical element to tilt relative to an optical axis of the image forming optical system.
3. A mark position detecting apparatus according to claim 1 , further comprising:
a control unit that controls the adjustment unit based upon results of measurement by the measurement unit to adjust the distribution state of the distortion.
4. A mark position detecting apparatus according to claim 1 , further comprising:
a substrate supporting unit that supports the substrate so as to allow the substrate to rotate around an optical axis of the image forming optical system, wherein:
the measurement unit adjusts a rotational state of the substrate by controlling the substrate supporting unit and measures the distribution state of the distortion by using the image signals input from the image capturing unit before and after rotating the substrate by 180 degrees.
5. A mark position detecting apparatus according to claim 1 , wherein:
the adjustment unit adjusts the distortion so that the distortion achieves substantial symmetry relative to a field center of the image forming optical system.
6. A mark position detecting apparatus according to claim 2 , further comprising:
a coma aberration correction unit that corrects a coma aberration manifesting at the image forming optical system.
7. A mark position detecting apparatus according to claim 6 , wherein:
the coma aberration correction unit comprises an optical element shift supporting unit that supports an optical element constituting another part of the image forming optical system so as to allow the optical element constituting the another part to shift in a plane substantially perpendicular to the optical axis of the image forming optical system.
8. A mark position detecting apparatus according to claim 7 , further comprising:
a control unit that controls the adjustment unit and the coma aberration correction unit so as to correct the coma aberration of the image forming optical system by causing the optical element constituting the another part to shift after adjusting a tilt state of the optical element constituting the one part of the image forming optical system.
9. A mark position detecting apparatus according to claim 1 , wherein:
the adjustment unit adjusts the distortion so that the distortion achieves substantial symmetry relative to an optical axis of the image forming optical system.
10. A mark position detecting apparatus according to claim 9 , further comprising:
a substrate supporting unit that supports the substrate so as to position central positions of the marks formed on the substrate in a vicinity of the optical axis of the image forming optical system.
11. A mark position detecting apparatus comprising:
an illuminating unit that illuminates a mark on a substrate;
an image forming optical system that forms an image of the mark with light from the mark;
an image capturing unit that captures the image of the mark and outputs image signals;
a substrate supporting unit that supports the substrate so as to allow the substrate to rotate around an optical axis of the image forming optical system;
a measurement unit that adjusts a rotational state of the substrate by controlling the substrate supporting unit and measures positions of the mark before and after rotating the substrate by 180 degrees by using the image signals input from the image capturing unit before and after rotation of the substrate;
an adjustment unit that adjusts distortion manifesting at the image forming optical system based upon the positions of the mark measured with the measurement unit; and
a calculation unit that calculates a position of the mark based upon the image signals input from the image capturing unit.
12. A mark position detecting apparatus according to claim 11 , wherein:
the adjustment unit comprises an optical element tilt supporting unit that supports an optical element constituting at least part of the image forming optical system so as to allow an optical axis of the optical element to tilt relative to an optical axis of the image forming optical system.
13. A mark position detecting apparatus according to claim 11 , further comprising:
a control unit that controls the adjustment unit based upon results of measurement by the measurement unit to adjust a distribution state of the distortion.
14. A mark position detecting apparatus according to claim 11 , wherein:
the adjustment unit adjusts the distortion so that the distortion achieves substantial symmetry relative to a field center of the image forming optical system.
15. A mark position detecting apparatus according to claim 12 , further comprising:
a coma aberration correction unit that corrects a coma aberration manifesting at the image forming optical system.
16. A mark position detecting apparatus according to claim 15 , wherein:
the coma aberration correction unit comprises an optical element shift supporting unit that supports an optical element constituting another part of the image forming optical system so as to allow the optical element constituting the another part to shift in a plane substantially perpendicular to the optical axis of the image forming optical system.
17. A mark position detecting apparatus according to claim 15 , further comprising:
a control unit that controls the adjustment unit and the coma aberration correction unit so as to correct the coma aberration of the image forming optical system by causing an optical element constituting another part of the image forming optical system to shift after adjusting a tilt state of the optical element constituting the at least part of the image forming optical system.
18. A mark position detecting apparatus according to claim 11 , wherein:
the adjustment unit adjusts the distortion so that the distortion achieves substantial symmetry relative to an optical axis of the image forming optical system.
19. A mark position detecting apparatus according to claim 18 , wherein:
the substrate supporting unit positions a central position of the mark formed on the substrate in the vicinity of the optical axis of the image forming optical system.