Lithographic apparatus and device manufacturing method
A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
1. A lithographic apparatus comprising:
an illumination system that conditions a beam of radiation;
an article support member that supports an article to be placed in a beam path of said beam of radiation; and
a movable carriage for moving said article support member,
wherein said carriage comprises a compartmented composite structure.
2. A lithographic apparatus according to claim 1 , wherein said carriage provides an interface between a long stroke and a short stroke actuator, and wherein said carriage further comprises a first sensor for driving said long stroke actuator and a second sensor, positioned at a distance from said first sensor, for driving said short stroke actuator so as to arrange said article to be placed on a predetermined location.
3. A lithographic apparatus according to claim 2 , wherein said long stroke actuator is a planar magnetic motor.
4. A lithographic apparatus according to claim 1 , wherein said carriage comprises a non-composite mounting interface and/or cooling interface for mounting and/or cooling a short stroke actuator.
5. A lithographic apparatus according to claim 4 , wherein said carriage is uncooled.
6. A lithographic apparatus according to claim 4 , wherein said non-composite mounting interface comprises a metal and/or ceramic material glued to said composite material.
7. A lithographic apparatus according to claim 4 , wherein said cooling interface comprises a metal cooling surface.
8. A lithographic apparatus according to claim 7 , wherein said metal cooling surface is coupled to a duct for ducting coolant.
9. A lithographic apparatus according to claim 8 , wherein said duct comprises a composite material.
10. A lithographic apparatus according to claim 1 , wherein said composite is chosen from a group of low coefficient of thermal expansion (CTE) materials.
11. A lithographic apparatus according to claim 10 , wherein said composite comprises carbon fiber.
12. A lithographic apparatus according to claim 1 , wherein said composite structure comprises at least one composite box structure.
13. A lithographic apparatus according to claim 12 , wherein said box structure comprises a base plate and upstanding contours.
14. A lithographic apparatus according to claim 13 , wherein the upstanding contours are integral with the base plate.
15. A lithographic apparatus according to claim 13 , wherein the upstanding contours comprise an L-form extremal mounting profile for gluing to a cover plate.
16. A lithographic apparatus according to claim 12 , wherein said composite box structure comprises a rectangular outer box and a triangular inner box provided in said outer box.
17. A lithographic apparatus according to claim 12 , wherein said composite box structure comprises a composite rib structure.
18. A lithographic apparatus according to claim 17 , wherein said rib structure is glued to the box structure.
19. A lithographic apparatus according to claim 18 , wherein said rib structure comprises an L-form extremal mounting profile for gluing to a cover plate.
20. A lithographic apparatus according to claim 1 , wherein said composite structure comprises a plurality of boxed compartments glued together.
21. A lithographic apparatus according to claim 1 , wherein said article support is a support for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section.
22. A lithographic apparatus according to claim 1 , wherein said article support is a substrate table for holding a substrate to be patterned by a patterned beam onto a target portion of the substrate.