IP Library › Granted Patent US 7,019,303
Granted Patent B2
US 7,019,303 · App. 10/343,438 · Granted Mar 28, 2006

Radiation ray detector and method of manufacturing the detector

Assignee: Hamamatsu Photonics K.K.
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Quick Facts
Patent No.
US 7,019,303
App. No.
10/343,438
Granted
Mar 28, 2006
Kind
B2
Abstract

The light receiving sections of solid-state image sensing devices ( 2 a and 2 b ) are disposed on a base ( 1 ) to adjoin each other, and are fixed with an adhesive resin ( 11 ). A transparent film ( 3 ) is formed on the light receiving sections so as to wholly cover a gap ( 25 ) and have a flat surface on which a layer of a scintillator ( 4 ) is formed.

Claims (29)

1. A radiation detector comprising:

a plurality of image sensor panel each of which has a substrate and a light receiving section formed by two-dimensionally arranging a plurality of photoelectric detectors on said substrate in the vicinity of at least one side of said substrate,

a base on which said light receiving sections of said image sensor panels are arranged to be adjacent to each other,

a surface-flat, transparent film integrally covering the whole of said light receiving sections of said image sensor panels, and

a scintillator formed directly on said transparent film,

wherein a gap generated between said plurality of image sensor panels is 50 μm or less, and said transparent film is 2 μm to 30 μm in thickness.

2. A radiation detector comprising:

a plurality of image sensor panel each of which has a substrate and a light receiving section formed by two-dimensionally arranging a plurality of photoelectric detectors on said substrate in the vicinity of at least one side of said substrate,

a base on which said light receiving sections of said image sensor panels are arranged to be adjacent to each other,

a surface-flat, transparent film integrally covering the whole of said light receiving sections of said image sensor panels, and

a scintillator formed directly on said transparent film,

wherein a gap generated between said plurality of image sensor panels is 50 μm to 70 μm, and said transparent film is 5 μm to 30 μm in thickness.

3. The radiation detector according to any one of claims 1 to 2 , wherein said image sensor panel has a circuit section electrically connected to said photoelectric detectors.

4. The radiation detector according to any one of claims 1 to 2 , wherein the number of said plurality of image sensor panels is two.

5. The radiation detector according to any one of claims 1 to 2 , wherein the number of said plurality of image sensor panels is four, and the four image sensor panels are connected to each other in two-by-two array.

6. The radiation detector according to any one of claims 1 to 2 , further comprising a protective film covering said scintillator for sealing.

7. A method for manufacturing a radiation detector, the method comprising steps of:

preparing a plurality of image sensor panels each of which has a light receiving section formed by two-dimensionally arranging a plurality of photoelectric detectors on a substrate in the vicinity of at least one side of the substrate,

arranging said image sensor panels on a base so that the light receiving sections are adjacent to each other,

forming a surface-flat, transparent film to integrally cover a surface of the whole of the light receiving sections of the image sensor panels, including gaps generated therebetween, and

forming a scintillator directly on said transparent film,

wherein a gap generated between said plurality of image sensor panels is 50 μm or less, and said transparent film is 2 μm to 30 μm in thickness.

8. The method according to claim 7 , further comprising a step of forming a protective film covering the scintillator for sealing.

9. A method for manufacturing a radiation detector, the method comprising steps of:

preparing a plurality of image sensor panels each of which has a light receiving section formed by two-dimensionally arranging a plurality of photoelectric detectors on a substrate in the vicinity of at least one side of the substrate,

arranging said image sensor panels on a base so that the light receiving sections are adjacent to each other,

forming a surface-flat, transparent film to integrally cover a surface of the whole of the light receiving sections of the image sensor panels, including gaps generated therebetween, and

forming a scintillator directly on said transparent film,

wherein a gap generated between said plurality of image sensor panels is 50 μm to 70 μm, and said transparent film is 5 μm to 30 μm in thickness.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 21, 2003
From: HOMME, TAKUYA; TAKABAYASHI, TOSHIO
To: HAMAMATSU PHOTONICS K.K.
Reel/Frame 014132/0857 →
Priority Claims (1)
JP 2000-235874 · Aug 3, 2000 · national
Continuity (1)
Related Publication 20030173493A1 · Sep 18, 2003