Ion beam extractor with counterbore
View Patent ↗An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in the first electrode (or the second electrode or both) have a counterbore on the downstream side (i.e. away from the plasma ion source or facing the second electrode). The counterbored extraction system reduces aberrations and improves focusing. The invention also includes an ion source with the counterbored extraction system, and a method of improving focusing in an extraction system by providing a counterbore.
1. An extraction system for a plasma ion source, comprising:
a first electrode having at least one aperture therein for extracting ions from an adjacent plasma;
a counterbore around each aperture on the opposed side from the plasma.
2. The extraction system of claim 1 wherein the counterbore has a diameter substantially greater than the aperture.
3. The extraction system of claim 1 wherein the aperture has a diameter of about 100 μm and a length of about 500 μm, and the counterbore has a diameter of about 300 μm and a depth of about 150 μm to about 250 μm.
4. The extraction system of claim 1 further comprising a second electrode spaced apart from the first electrode and having an aperture aligned with each aperture of the first electrode.
5. The extraction system of claim 4 further comprising means to apply voltages to the electrodes.
6. The extraction system of claim 1 wherein the electrode has a single aperture.
7. The extraction system of claim 1 wherein the electrode has multiple apertures.
8. A plasma ion source, comprising:
a plasma generating region;
the extraction system of claim 1 positioned adjacent the plasma generating region.
9. The plasma ion source of claim 8 wherein the counterbore has a diameter substantially greater tan the aperture.
10. The plasma ion source of claim 8 wherein the aperture has a diameter of about 100 μm and a length of about 500 μm, and the counterbore has a diameter of about 300 μm and a depth of about 150 μm to about 250 μm.
11. The plasma ion source of claim 8 further comprising a second electrode spaced apart from the first electrode and having an aperture aligned with each aperture of the first electrode.
12. The plasma ion source of claim 11 further comprising means to apply voltages to the electrodes.
13. The plasma ion source of claim 8 wherein the electrode has a single aperture.
14. The plasma ion source of claim 8 wherein the electrode has multiple apertures.
15. A method of reducing aberrations and improving focusing of an extraction system electrode for a plasma ion source, comprising:
providing a counterbore around each aperture in the electrode on an opposed side of the electrode from a plasma generating region.
16. The method of claim 15 wherein the counterbore has a substantially greater diameter than the aperture.
17. The method of claim 15 further comprising applying a voltage to the electrode to produce an electric field whose equipotential lines extend into the counterbore.
18. An extraction system for a plasma ion source, comprising:
a first electrode having at least one aperture therein for extracting ions from an adjacent plasma;
a counterbore around each aperture on the opposed side from the plasma; and
a magnetic filter to reduce the energy spread of the extracted ions.
19. An extraction system for a plasma ion source, comprising:
a multicusp plasma generator;
a first electrode having at least one aperture therein for extracting ions from an adjacent plasma generated in the multicusp plasma generator;
a counterbore around each aperture on the opposed side from the plasma.
20. An extraction system for a plasma ion source, comprising:
a first electrode having at least one separately switched aperture therein for extracting ions from an adjacent plasma, wherein each aperture ion extraction is a beamlet; and
a counterbore around each aperture on the opposed side from the plasma.
21. A method of reducing aberrations and improving focusing of an extraction system electrode for a plasma ion source, comprising:
providing a counterbore around each of a plurality of switchable apertures in an electrode on an opposed side of the electrode from a plasma generating region,
whereby each aperture is capable of extracting a beamlet from the plasma generating region; and
separately switching each beamlet.
22. An extraction system for a plasma ion source, comprising:
a first electrode having at least one aperture therein for extracting ions from an adjacent plasma;
a counterbore around each aperture on the opposed side from the plasma;
wherein the aperture has a diameter of about 100 μm and a length of about 500 μm, and the counterbore has a diameter of about 300 μm and a depth of about 150 μm to about 250 μm.
23. An extraction system for a plasma ion source, comprising:
a plasma generating region;
a first electrode having at least one aperture therein for extracting ions from an adjacent plasma, forming an extraction system, the extraction system positioned adjacent the plasma generating region; and
a counterbore around each aperture on the opposed side from the plasma,
wherein the aperture has a diameter of about 100 μm and a length of about 500 μm, and the counterbore has a diameter of about 300 μm and a depth of about 150 μm to about 250 μm.