IP Library Granted Patent US 7,084,572
Granted Patent B2
US 7,084,572 · App. 10/481,778 · Granted Aug 1, 2006

Plasma-accelerator configuration

Assignee: Thales Electron Devices GmbH
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Quick Facts
Patent No.
US 7,084,572
App. No.
10/481,778
Granted
Aug 1, 2006
Kind
B2
Abstract

The invention relates to various advantageous embodiments of a plasma-accelerator configuration, especially for the configuration and design of electron sources used for ionizing the working gas and/or neutralizing the discharged plasma jet.

Claims (11)

1. Plasma accelerator configuration for emission of an accelerated plasma beam in a longitudinal direction, having a plasma chamber delimited laterally by a chamber wall, between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, and an electron source formed by a partial surface of the acceleration electrode, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, whereby the electron source is formed by a passive electron surface within the plasma chamber, which surface is impacted by part of the plasma beam and releases electrons when the ions impact.

2. Configuration according to claim 1 , wherein the passive electrode surface is laterally spaced apart from a center longitudinal axis of the plasma chamber.

3. Configuration according to claim 1 , wherein the passive electrode surface is arranged on the chamber wall.

4. Configuration according to claim 1 , wherein the passive electrode surface is structured as a ring surface or as individual surfaces arranged about the center longitudinal axis in ring shape.

5. Configuration according to claim 1 , wherein the electron source is metallic.

6. Configuration according to claim 1 , wherein the electron source additionally delivers electrons for neutralizing the exiting plasma beam.

7. Plasma accelerator configuration for emission of a directed accelerated plasma beam, having a plasma chamber between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, as well as a magnetic field configuration and an electron source, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, wherein the plasma chamber is structured with rotation symmetry about and contains a longitudinal axis, and wherein the magnetic field configuration in the longitudinal direction has at least one first magnetic pole that surrounds the plasma chamber, the counter-pole of which is spaced apart from the first magnetic pole in the longitudinal direction, and the electron source comprises an electrode arranged on the side of the plasma beam exit, arranged outside the plasma chamber, and wherein the magnetic field configuration has more than two alternating consecutive roles in the longitudinal direction.

8. Configuration according to claim 7 , wherein one or more additional electrodes are provided between the anode and the acceleration electrode, which lie at intermediate potentials between the potentials of the acceleration electrode and the anode.

9. Configuration according to claim 7 , wherein the external electron source additionally delivers a neutralizing stream for a non-neutral plasma beam that exits from the plasma chamber.

10. Configuration according to claim 7 , wherein the plasma chamber is closed on the anode side and that no electron beam is passed into the plasma chamber from the anode side that lies opposite the plasma beam exit in the longitudinal direction.

11. Plasma accelerator configuration for emission of an accelerated plasma beam in a longitudinal direction, having a plasma chamber delimited laterally by a chamber wall, between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, and an electron source, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, whereby the electron source is formed by a passive electron surface within the plasma chamber, which surface is impacted by part of the plasma beam and releases electrons when the ions impact, wherein one or more intermediate electrodes are arranged in the longitudinal direction, between the anode and the acceleration electrode, which lie at electrical intermediate potentials, and a multistage magnet configuration in the longitudinal direction generates a magnetic field having a concentration of radial magnetic field components between consecutive electrodes.

Assignments (3)
MERGER Recorded Aug 30, 2013
From: THALES ELECTRON DEVICES GMBH
To: THALES AIR SYSTEMS & ELECTRON DEVICES GMBH
Reel/Frame 031262/0607 →
MERGER Recorded Aug 30, 2013
From: THALES AIR SYSTEMS & ELECTRON DEVICES GMBH
To: THALES ELECTRONIC SYSTEMS GMBH
Reel/Frame 031304/0830 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 19, 2004
From: KORNFELD, GUNTER; SCHWERTFEGER, WERNER; LENZ, ROLAND; COUSTOU, GREGORY
To: THALES ELECTRON DEVICES GMBH
Reel/Frame 015337/0513 →
Priority Claims (1)
DE 101 30 464 · Jun 23, 2001 · national
Continuity (1)
Related Publication 20040183452A1 · Sep 23, 2004