AI
An Al 2 O 3 and ZrO 2 based abrasive grain containing titanium compounds in a reduced form, especially in the form of oxides and/or suboxides and/or carbides and/or oxycarbides and/or oxycarbonitrides and/or suicides, corresponding to a proportion of 0.510 wt. %, expressed as TiO 2 , containing 20–50 wt. % ZrO 2 , wherein more than 75 wt. % of the ZrO 2 is present in a tetragonal crystal form, having an overall carbon content of 0.03–0.5 wt. %, a proportion of impurities caused by raw materials of less than 3.0 wt. %, wherein the rare earth content calculated in the form of oxides is less than 0.1 wt. %, having an Si-compound content of 0.05–1.0 wt. %, expressed as SiO 2 , and an Al 2 O 3 content of 50–80 wt. %, obtained by melting a mixture required for a corresponding abrasive grain composition, said mixture corresponding to Al 2 O 3 , ZrO 2 , TiO 2 and TiO 2 , and/or raw materials containing the latter in the presence of a surplus of a reducing agent and quenched in such a way that the melt is fully solidified in less than 10 seconds. The invention also relates to a method for the production thereof and the use thereof in abrasives.
1. A process for making alumina-zirconia abrasive grain product comprising:
forming a melt from a mixture of source materials containing aluminum oxide, zirconium oxide, titanium oxide and silicon oxide in the presence of excess carbon as a reducing agent wherein the amount of silicon oxide is from 2.0 to 5.7 wt-% relative to all of the source materials; and
quenching the melt to produce the abrasive grain product comprising:
(a) aluminum oxide;
(b) zirconium oxide with at least 85 wt.-% thereof being in tetragonal crystal form;
(c) titanium compounds in reduced form of oxide, suboxides, carbides, oxycarbides, oxycarbonitrides, silicides or mixtures thereof present from 2–5 wt.-%;
(d) silicon compounds content, expressed as silicon oxide, between 0.2 and 0.7 wt.-%;
(e) overall carbon content between 0.03 and 0.5 wt.-%,
(f) impurities content derived from source materials being less than 3 wt.-% and rare earths content, expressed as oxides, of less than 0.1 wt.-%, and
(g) the abrasive grain having an extremely fine structure with dentritic eutectic domains of aluminum oxide and zirconium oxide with a median cross section of less than 15 microns.
2. The process according to claim 1 wherein the amount of the impurities from the source materials is below 1 wt. %.
3. The process according to claim 1 wherein 35–45 wt. % of the ZrO 2 and 55–65 wt. % of the Al 2 O 3 , are present in the eutectic composition.
4. The process according to claim 1 wherein the liquid melt is quenched to completely solidified form in fewer than 5 seconds.
5. The process according to claim 1 wherein alum earth is used as source material for Al 2 O 3 .
6. The process according to claim 1 wherein the source materials for ZrO 2 are selected from baddeleyite, zircon sand, man-made zircon concentrates or a mixture thereof.
7. The process according to claim 1 wherein rutile is used as source material for TiO 2 .
8. The process according to claim 1 wherein the source materials for SiO 2 are selected from quartz, mullite, zircon sand or a mixture thereof.
9. Method of producing a flexible abrasive comprising disposing the grain produced by the process of claim 1 on a flexible substrate and adhering the abrasive thereto.
10. Method of producing a bonded abrasive comprising the steps of consolidating abrasive grain produced by the process of claim 1 in a bonding matrix.
11. The process according to claim 1 wherein the tetragonal crystal structure of the zirconium oxide content is at least 90 wt.-%.
12. The process according to claim 4 wherein the melt is quenched in such a way as to achieve complete solidification in less than 3 seconds.
13. The process according to claim 1 wherein the silicon compounds content, expressed as silicon oxide is between 0.2 and 0.49 wt.-%.
14. A process for making an abrasive grain comprising:
providing a mixture of source materials comprising Al 2 O 3 , ZrO 2 , TiO 2 and SiO 2 in the presence of excess carbon as a reducing agent, wherein the amount of SiO 2 relative to the amount of TiO 2 in the mixture as defined by a ratio SiO 2 wt-%/TiO 2 wt-% is from 0.59 to 1.62 and wherein the amount of silicon oxide is from 2.0 to 5.7 wt-% relative to all of the source materials;
heating the mixture to form a melt and exposing the melt to reducing conditions; and
quenching the melt to a solid from, wherein the amount of ZrO 2 in the abrasive grain is between 20 and 50 wt-% with at least 85 wt.-% of the ZrO 2 in tetragonal crystal form, and the amount of silicon compounds in the abrasive grain, expressed as silicon oxide, is between 0.2 and 0.7 wt.-%.
15. The process according to claim 14 wherein the ratio SiO 2 wt-%/TiO 2 wt-% is from 0.59 to 1.18.
16. The process according to claim 14 wherein the quenching of the melt to solid form occurs in gaps that exist between cooling plates and is complete within 5 seconds.
17. The process according to claim 16 wherein the gaps of the cooling plates are from 3 mm to 5 mm.
18. The process according to claim 1 wherein the amount of silicon compounds, expressed as silicon oxide, is between 0.32 and 0.49 wt.-%.
19. The process according to claim 14 wherein the amount of silicon compounds, expressed as silicon oxide, is between 0.32 and 0.49 wt.-%.