IP Library Granted Patent US 7,132,621
Granted Patent B2
US 7,132,621 · App. 10/430,426 · Granted Nov 7, 2006

Plasma catalyst

Assignee: Dana Corporation
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Quick Facts
Patent No.
US 7,132,621
App. No.
10/430,426
Granted
Nov 7, 2006
Kind
B2
Abstract

Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.

Claims (28)

1. A method of forming a plasma comprising:

flowing a gas into a multi-mode processing cavity; and

igniting the plasma by subjecting the gas in the cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of at least one passive plasma catalyst comprising a material that is at least electrically semi-conductive,

wherein the plasma catalyst comprises at least one electrically conductive component and at least one additive in a ratio, the method further comprising sustaining the plasma, wherein the sustaining comprises:

directing additional electromagnetic radiation into the cavity; and

allowing the catalyst to be consumed by the plasma such that the plasma contains the at least one additive, and

wherein the ratio differs for differing portions of the catalyst, and wherein the allowing comprises allowing the differing portions of the catalyst to be consumed by the plasma at differing times such that the plasma contains a varying ratio of the electrically conductive component to the at least one additive.

2. A method of forming a plasma comprising:

flowing a gas into a multi-mode processing cavity; and

igniting the plasma by subjecting the gas in the cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of at least one passive plasma catalyst comprising a material that is at least electrically semi-conductive,

wherein the multi-mode cavity is configured to support at least a first mode and a second mode of the radiation, each of the modes having a maximum electric field vector in the cavity, each of the vectors having a magnitude, and wherein a ratio between the first mode magnitude and the second mode magnitude is less than about 1:10.

3. The method of claim 2 , wherein the ratio is less than about 1:5.

4. The method of claim 3 , wherein the ratio is less than about 1:2.

5. The method of claim 4 , wherein the multi-mode cavity is configured to support at least a first mode and a second mode of the radiation, each of the modes having at least one maximum electric field vector in the cavity at a position, the method further moving each of the positions by mode-mixing.

6. A method of forming a plasma comprising:

flowing a gas into a multi-mode processing cavity; and

igniting the plasma by subjecting the gas in the cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of at least one passive plasma catalyst comprising a material that is at least electrically semi-conductive,

wherein the catalyst is located at the tip of a substantially electrically non-conductive extender that passes through an ignition port formed in a radiation chamber.

7. A method of forming a plasma comprising:

flowing a gas into a multi-mode processing cavity; and

igniting the plasma by subjecting the gas in the cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of at least one passive plasma catalyst comprising a material that is at least electrically semi-conductive,

wherein the catalyst comprises a plurality of discontiguous segments separated by and mechanically connected to a plurality of electrically non-conductive segments, wherein during the igniting the catalyst extends through an ignition port in the cavity between a location inside the cavity and another location outside the cavity.

8. A method of forming a plasma in a system, wherein the system has at least a first ignition cavity and a second cavity in fluid communication with the first cavity, the method comprising:

subjecting a gas in the first ignition cavity to electromagnetic radiation having a frequency less than about 333 GHz, such that the plasma in the first cavity causes a plasma to form in the second cavity; and

sustaining the second plasma by subjecting it to additional electromagnetic radiation,

wherein the first cavity is smaller than the second cavity, and

wherein the first cavity is substantially a single mode cavity and the second cavity is a multi-mode cavity.

9. The method of claim 8 , wherein the second cavity is highly moded.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 12, 2006
From: DANA CORPORATION
To: BTU INTERNATIONAL INC.
Reel/Frame 017777/0430 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2005
From: KUMAR, SATYENDRA; KUMAR, DEVENDRA
To: DANA CORPORATION
Reel/Frame 016388/0035 →
Continuity (4)
Provisional Application 6037869300 · May 8, 2002
Provisional Application 6043067700 · Dec 4, 2002
Provisional Application 6043527800 · Dec 23, 2002
Related Publication 20040118816A1 · Jun 24, 2004