Method for manufacturing multi-thickness gate dielectric layer of semiconductor device
In a method for manufacturing a multi-thickness gate dielectric layer of a semiconductor device, a first dielectric layer is formed on a semiconductor substrate. A second dielectric layer is formed using a different dielectric material from the material constituting the first dielectric layer on the first dielectric layer. A portion of the second dielectric layer is selectively removed so as to selectively expose the first dielectric layer under the second dielectric layer. A portion of the exposed first dielectric layer is selectively removed so as to selectively expose the semiconductor substrate under the exposed first dielectric layer. Thereafter, a third dielectric layer having a thinner thickness than the first dielectric layer is formed on the exposed semiconductor substrate. As a result, a gate dielectric layer is formed to include a thick portion formed of the first dielectric layer and remaining second dielectric layer, a medium-thickness portion formed of the remaining first dielectric layer, and a thin portion formed of the third dielectric layer.
1. A method for manufacturing a multi-thickness gate dielectric layer of a semiconductor device, the method comprising:
forming a first dielectric layer on a semiconductor substrate;
forming a second dielectric layer on the first dielectric layer, the second dielectric layer having a different dielectric material from that of the first dielectric layer;
selectively removing a portion of the second dielectric layer so as to selectively expose a portion of the first dielectric layer under the second dielectric layer;
selectively removing a portion of the exposed first dielectric layer so as to selectively expose a portion of the semiconductor substrate under the exposed first dielectric layer; and
forming a third dielectric layer having a thickness that is thinner than that of the first dielectric layer on the exposed semiconductor substrate, to form a gate dielectric layer including a thick portion formed of the first dielectric layer and remaining second dielectric layer, a medium-thickness portion formed of the exposed first dielectric layer, and a thin portion formed of the third dielectric layer.
2. The method as claimed in claim 1 , wherein the first dielectric layer, the second dielectric layer, or the third dielectric layer is formed of a material selected from the group consisting of: silicon oxide, silicon nitride, hafnium oxide, aluminum oxide, zirconium oxide, and tantalum oxide.
3. The method as claimed in claim 1 , wherein the first dielectric layer or the third dielectric layer is formed of thermal oxide.
4. The method as claimed in claim 1 , wherein the first dielectric layer or the third dielectric layer is formed of silicon oxide using rapid thermal oxidation.
5. The method as claimed in claim 1 , wherein the first dielectric layer, the second dielectric layer, or the third dielectric layer is formed of hafnium oxide or aluminum oxide using atomic layer deposition.
6. The method as claimed in claim 1 , wherein the selective removal of the second dielectric layer comprises:
applying a first photoresist pattern on a portion of the second dielectric layer; and
primarily etching an exposed portion of the second dielectric layer adopting a dry or wet etch process by using the first photoresist pattern as an etch mask,
and wherein the selective removal of the portion of the exposed first dielectric layer comprises:
applying a second photoresist pattern covering the remaining second dielectric layer and the portion of the exposed first dielectric layer; and
secondarily etching a portion of the portion of the exposed first dielectric layer adopting a dry or wet etch process by using the second photoresist pattern as an etch mask.
7. The method as claimed in claim 6 , wherein the primary etching process is performed such that an etch rate of the second dielectric layer is higher than that of the first dielectric layer.
8. The method as claimed in claim 1 , further comprising nitridizing a surface of the gate dielectric layer.
9. The method as claimed in claim 1 , wherein the third dielectric layer is formed by deposition to extend over the remaining second dielectric layer and first dielectric layer.
10. The method as claimed in claim 1 , further comprising forming a fourth dielectric layer using a different material from that of the second dielectric layer, on the second dielectric layer; and
selectively removing a portion of the fourth dielectric layer so as to selectively expose a portion of the second dielectric layer under the fourth dielectric layer,
wherein the gate dielectric layer in the thick portion includes the remaining fourth dielectric layer, second dielectric layer, and first dielectric layer, which are stacked.
11. A method for manufacturing a multi-thickness gate dielectric layer of a semiconductor device, the method comprising:
forming a first dielectric layer on a semiconductor substrate;
forming a second dielectric layer on the first dielectric layer, the second dielectric layer having a different dielectric material from that of the first dielectric layer;
selectively removing a portion of the second dielectric layer so as to selectively expose a portion of the first dielectric layer under the second dielectric layer;
selectively removing a portion of the exposed first dielectric layer so as to selectively expose a portion of the semiconductor substrate under the exposed first dielectric layer; and
forming a third dielectric layer having a thickness that is thinner than that of the first dielectric layer on the exposed semiconductor substrate, on the remaining first dielectric layer and on the remaining second dielectric layer, to form a gate dielectric layer including a thick portion formed of the remaining first dielectric layer, remaining second dielectric layer and third dielectric layer, a medium-thickness portion formed of the remaining first dielectric layer and third dielectric layer, and a thin portion formed of the third dielectric layer.