Gallium nitride semiconductor light emitting device having multi-quantum-well structure active layer, and semiconductor laser light source device
A gallium nitride semiconductor laser device has an active layer ( 6 ) made of a nitride semiconductor containing at least indium and gallium between an n-type cladding layer ( 5 ) and a p-type cladding layer ( 9 ). The active layer ( 6 ) is composed of two quantum well layers ( 14 ) and a barrier layer ( 15 ) interposed between the quantum well layers, and constitutes an oscillating section of the semiconductor laser device. The quantum well layers ( 14 ) and the barrier layer ( 15 ) have thicknesses of, preferably, 10 nm or less. In this semiconductor laser device, electrons and holes can be uniformly distributed in the two quantum well layers ( 14 ). In addition, electrons and holes are effectively injected into the quantum well layers from which electrons and holes have already been disappeared by recombination. Consequently, the semiconductor laser device has an excellent laser oscillation characteristic.
1. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and
the ridge structure has a width of about 1 μm to 5 μm.
2. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and said p-type cladding layer has a ridge portion and a planar portion on opposite sides of the ridge portion, and the planar portion has a film thickness of 0.05 μm to 0.5 μm.
3. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and each of the quantum well layers has electrons and holes uniformly distributed therein.
4. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and
the semiconductor laser device is a self-oscillating semiconductor laser device.
5. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a Quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers;
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure, wherein each quantum well layer has a layer thickness of 10 nm or less; and
a driving circuit for injecting an electric current into the semiconductor laser device.
6. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and the electric current is a modulated current and a modulation frequency of the current is 300 MHz or more.
7. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well layers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and
said laser device generates a modulated optical output when an electric current is injected thereinto.
8. A gallium nitride semiconductor laser device having emission wavelengths within a band corresponding to ultraviolet to green and having a ridge structure, comprising:
an active layer having a quantum well structure and made of nitride semiconductor containing at least indium and gallium, said active layer consisting of two quantum well layers and one barrier layer interposed between the quantum well lavers; and
an n-type cladding layer and a p-type cladding layer between which the active layer is disposed, said p-type cladding layer forming at least part of the ridge structure,
wherein each quantum well layer has a layer thickness of 10 nm or less, and a layer disposed at a foot of the ridge structure has a layer thickness of 0.05 μm to 0.5 μm.
9. The gallium nitride semiconductor laser device according to claim 1 , further comprising an insulating film formed over side faces of the ridge and over surfaces which are located on both sides of the ridge and from which the ridge is projected.
10. The gallium nitride semiconductor laser device according to claim 9 , further comprising an electrode formed on an upper surface of the ridge and over the insulating film.