Material independent optical profilometer
A material independent optical profilometer system and method for measuring at least one of either a height or a slope of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.
1. A system for measuring a height of an object comprising:
a first electromagnetic signal source for transmitting an electromagnetic signal;
a beam splitter for receiving said electromagnetic signal and outputting a first signal toward a first position on the object at a first angle and a second signal toward said first position on the object at a second angle, wherein said first and second signals are electromagnetic signals;
a first retro-reflection unit for reflecting a first single reflected signal toward said first position on said object, wherein said first single reflected signal is a portion of said first signal that reflects off of the object;
a first detector to receive a first double reflected signal, wherein said first double reflected signal is a portion of said first single reflected signal that reflects off of said object and for generating a first output in response to said first double reflected signal;
a second retro-reflection unit for reflecting a second single reflected signal toward said first position on said object, wherein said second single reflected signal is a portion of said second signal that reflects off of said object;
a second detector to receive a second double reflected signal wherein said second double reflected signal is a portion of said second single reflected signal that reflects off of said object and for generating a second output in response to said second double reflected signal; and
a processor, that receives said first and second output and generates a material independent signal representing a height of said first position, said material independent signal being independent of the type of material comprising the object.
2. The system of claim 1 further comprising a translating device for translating the object in the radial direction to change said first position.
3. The system of claim 1 further comprising a translating device for translating the object in the circumferential direction to change said first position.
4. The system of claim 1 , wherein said detector is a quadrant detector.
5. The system of claim 1 , wherein said detector is a bi-cell detector.
6. The system of claim 1 , wherein said detector is a position sensitive detector.
7. The system of claim 1 , wherein said first electromagnetic signal sources is a laser.
8. The system of claim 1 , wherein said material independent signal is generated without said laser and said detectors contacting the object.
9. The system of claim 1 , wherein said object is an optical component.
10. The system of claim 1 , wherein said object is a semiconductor wafer.
11. The system of claim 1 , wherein said object is a thin film disk.
12. The system of claim 1 , wherein said object is a glass substrate.
13. A system for measuring a slope of an object comprising:
a first electromagnetic signal source for transmitting an electromagnetic signal;
a beam splitter for receiving said electromagnetic signal and outputting a first signal toward a first position on the object at a first angle and a second signal toward said first position on the object at a second angle, wherein said first and second signals are electromagnetic signals;
a first retro-reflection unit for reflecting a first single reflected signal toward said first position on said object, wherein said first single reflected signal is a portion of said first signal that reflects off of the object;
a first detector to receive a first double reflected signal, wherein said first double reflected signal is a portion of said first single reflected signal that reflects off of said object and for generating a first output in response to said first double reflected signal;
a second retro-reflection unit for reflecting a second single reflected signal toward said first position on said object, wherein said second single reflected signal is a portion of said second signal that reflects off of said object;
a second detector to receive a second double reflected signal wherein said second double reflected signal is a portion of said second single reflected signal that reflects off of said object and for generating a second output in response to said second double reflected signal; and
a processor, that receives said first and second output and generates a material independent signal representing a slope of said first position, said material independent signal being independent of the type of material comprising the object.
14. The system of claim 13 further comprising a translating device for translating the object in the radial direction to change said first position.
15. The system of claim 13 further comprising a translating device for translating the object in the circumferential direction to change said first position.
16. The system of claim 13 , wherein said detector is a quadrant detector.
17. The system of claim 13 , wherein said detector is a bi-cell detector.
18. The system of claim 13 , wherein said detector is a position sensitive detector.
19. The system of claim 13 , wherein said first electromagnetic signal sources is a laser.
20. The system of claim 13 , wherein said material independent signal is generated without said laser and said detectors contacting the object.
21. The system of claim 13 , wherein said object is an optical component.
22. The system of claim 13 , wherein said object is a semiconductor wafer.
23. The system of claim 13 , wherein said object is a thin film disk.
24. The system of claim 13 , wherein said object is a glass substrate.