IP Library › Granted Patent US 7,270,715

Granted Patent B2

US 7,270,715 · App. 10/695,726 · Granted Sep 18, 2007

Chemical vapor deposition apparatus

Assignee: Micron Technology, Inc.

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Quick Facts

Patent No.: US 7,270,715
App. No.: 10/695,726
Granted: Sep 18, 2007
Kind: B2

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Abstract

A chemical vapor deposition apparatus includes a subatmospheric substrate transfer chamber. A subatmospheric deposition chamber is defined at least in part by a chamber sidewall. A passageway in the chamber sidewall extends from the transfer chamber to the deposition chamber. Semiconductor substrates pass into and out of the deposition chamber through the passageway for deposition processing. A mechanical gate is included within at least one of the deposition chamber and the sidewall passageway, and is configured to open and close at least a portion of the passageway to the chamber. A chamber liner apparatus of a chemical vapor deposition apparatus forms a deposition subchamber within the chamber. At least a portion of the chamber liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

Claims (59)

1. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a passageway in the chamber sidewall extending from externally of the chamber to the chamber, and through which semiconductor substrates pass into and out of the chamber for deposition processing; and

a chamber liner apparatus forming a deposition subchamber within the chamber, at least a portion of the chamber liner apparatus being selectively movable to fully expose the passageway to the chamber and to fully cover the passageway from the chamber and to form a gas-tight seal between the passageway and the chamber, said portion of the chamber liner apparatus comprising opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section.

2. The apparatus of claim 1 further comprising a movable substrate holder received within the subchamber, the portion of the chamber liner apparatus being mounted for movement independent of movement of the substrate holder.

3. The apparatus of claim 1 further comprising a movable substrate holder received within the subchamber, the portion of the chamber liner apparatus being mounted for movement with movement of the substrate holder.

4. The apparatus of claim 1 wherein the portion of the chamber liner apparatus is mounted for elevational movement, upward movement of the portion of the chamber liner apparatus to a first position fully exposing the passageway, downward movement of the portion of the chamber liner apparatus to a second position fully covering the passageway.

5. The apparatus of claim 1 wherein the portion of the chamber liner apparatus is mounted for elevational movement, upward movement of the portion of the chamber liner apparatus to a first position fully covering the passageway, downward movement of the portion of the chamber liner apparatus to a second position fully exposing the passageway.

6. The apparatus of claim 1 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

7. The apparatus of claim 1 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

8. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a movable chamber liner apparatus forming a deposition subchamber within the chamber, the liner apparatus having a substrate opening therethrough, the liner apparatus being mounted for movement to a first position in which the opening is aligned with the passageway and to a second position in which the opening is not aligned with the passageway, the second position fully covering the passageway from the chamber with the liner apparatus and forming a gas-tight seal between the passageway and the chamber.

9. The apparatus of claim 8 wherein the passageway has a total open cross section where it joins with the chamber, the opening being at least as large as said cross section.

10. The apparatus of claim 8 wherein the passageway has a total open cross section where it joins with the chamber, the opening having a shape the same as that of said cross section.

11. The apparatus of claim 8 wherein the passageway has a total open cross section where it joins with the chamber, the opening having a size and shape the same as that of said cross section.

12. The apparatus of claim 8 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement independent of movement of the substrate holder.

13. The apparatus of claim 8 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement with movement of the substrate holder.

14. The apparatus of claim 8 wherein the liner apparatus is mounted for elevational movement, upward movement of the liner apparatus to the first position fully exposing the passageway, downward movement of the liner apparatus to the second position fully covering the passageway.

15. The apparatus of claim 8 wherein the liner apparatus is mounted for elevational movement, upward movement of the liner apparatus to the second position fully covering the passageway, downward movement of the liner apparatus to the first position fully exposing the passageway.

16. The apparatus of claim 8 wherein the chamber liner apparatus comprises opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section, the substrate opening being received in one of the opposing sidewall sections, the base being movable with the sidewall sections.

17. The apparatus of claim 8 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

18. The apparatus of claim 8 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

19. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a movable chamber liner apparatus forming a deposition subchamber within the chamber, the liner apparatus having a substrate opening therethrough, the opening being at least as large as said total open cross section of the passageway, the liner apparatus being mounted for elevational movement to a first position in which the opening is aligned with the passageway and to a second position in which the opening is not aligned with the passageway, the second position fully covering the passageway from the chamber with the liner apparatus and forming a gas-tight seal between the passageway and the chamber.

20. The apparatus of claim 19 wherein the opening has a shape the same as that of said cross section.

21. The apparatus of claim 19 wherein the opening has a size and shape the same as that of said cross section.

22. The apparatus of claim 19 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement independent of movement of the substrate holder.

23. The apparatus of claim 19 further comprising a movable substrate holder received within the subehamber, the chamber liner apparatus being mounted for movement with movement of the substrate holder.

24. The apparatus of claim 19 wherein the chamber liner apparatus comprises opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section, the substrate opening being received in one of the opposing sidewall sections, the base being movable with the sidewall sections.

25. The apparatus of claim 19 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

26. The apparatus of claim 19 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

27. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a passageway in the chamber sidewall extending from externally of the chamber to the chamber, and through which semiconductor substrates pass into and out of the chamber for deposition processing;

a chamber liner apparatus forming a deposition subchamber within the chamber, at least a portion of the chamber liner apparatus comprising opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section, said portion of the chamber liner apparatus including the opposing sidewall sections and the base being selectively movable to fully expose and to fully cover the passageway to the chamber; and

a movable substrate platform supported by an underside shaft, the base being received below the platform about the shaft.

28. The apparatus of claim 27 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

29. The apparatus of claim 27 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

30. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a passageway in the chamber sidewall extending from externally of the chamber to the chamber, and through which semiconductor substrates pass into and out of the chamber for deposition processing;

a movable chamber liner apparatus forming a deposition subchamber within the chamber, the liner apparatus having opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section, one of the opposing sidewall sections comprising a substrate opening therethrough, the liner apparatus with opposing sidewall sections and the base being mounted for movement to a first position in which the opening is aligned with the passageway and to a second position in which the opening is not aligned with the passageway; and

a movable substrate platform supported by an underside shaft, the base being received below the platform about the shaft.

31. The apparatus of claim 30 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement independent of movement of the substrate holder.

32. The apparatus of claim 30 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement with movement of the substrate holder.

33. The apparatus of claim 30 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

34. The apparatus of claim 30 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

35. A chemical vapor deposition apparatus comprising:

a chamber defined at least in part by a chamber sidewall;

a movable chamber liner apparatus forming a deposition subchamber within the chamber, the liner apparatus having opposing sidewall sections having inner face portions in at least one cross section and a base extending from and received between the opposing sidewall inner face portions in said at least one cross section, one of the opposing sidewall sections comprising a substrate opening therethrough, the opening being at least as large as said total open cross section of the passageway, the liner apparatus with opposing sidewall sections and the base being mounted for elevational movement to a first position in which the opening is aligned with the passageway and to a second position in which the opening is not aligned with the passageway.

36. The apparatus of claim 35 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement independent of movement of the substrate holder.

37. The apparatus of claim 35 further comprising a movable substrate holder received within the subchamber, the chamber liner apparatus being mounted for movement with movement of the substrate holder.

38. The apparatus of claim 35 wherein an entirety of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber.

39. The apparatus of claim 35 wherein only a part of the liner apparatus is selectively movable to fully expose and to fully cover the passageway to the chamber, another part of the liner apparatus not being mounted for movement.

Continuity (3)

Continuation 1013276700 · Apr 24, 2002

Division 1013276700

Related Publication 20040089240A1 · May 13, 2004