IP Library Granted Patent US 7,291,853
Granted Patent B2
US 7,291,853 · App. 11/493,945 · Granted Nov 6, 2007

Discharge produced plasma EUV light source

Assignee: Cymer, Inc.
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Quick Facts
Patent No.
US 7,291,853
App. No.
11/493,945
Granted
Nov 6, 2007
Kind
B2
Abstract

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.

Claims (19)

1. A discharge produced plasma EUV light source comprising:

a collector comprising a plurality of nested shell members arranged in relation to a plasma pinch location to form grazing angle of incidence reflectors of EUV light emitted from the plasma pinch; and

a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members.

2. The apparatus of claim 1 further comprising:

the temperature control mechanism comprises a heater.

3. The apparatus of claim 2 further comprising:

each nested shell member comprising:

a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and

a second grazing angle of incidence reflector clement collecting EUV light emitted from the first grazing angle of incidence reflector element.

4. The apparatus of claim 1 further comprising:

the temperature control mechanism comprises a heat remover.

5. The apparatus of claim 4 further comprising:

each nested shell member comprising:

a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and

a second grazing angle of incidence reflector element collecting the EUV light emitted from the first grazing angle of incidence reflector element.

6. The apparatus of claim 1 further comprising:

each nested shell member comprising:

a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and

a second grazing angle of incidence reflector element collecting the EUV light emitted from the first grazing angle of incidence reflector element.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032659/0256 →
MERGER Recorded Mar 10, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032397/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 11, 2008
From: TRINITY HEALTH, INC.
To: TRINITY HEALTH-MICHIGAN
Reel/Frame 020783/0509 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 26, 2006
From: FOMENKOV, IGOR V.; PARTLO, WILLIAM N.; BLUMENSTOCK, GERRY M.; BOWERING, NORBERT; OLIVER, I. ROGER; PAN, JASON; SIMMONS, RODNEY D.
To: CYMER, INC.
Reel/Frame 018306/0878 →
Continuity (11)
Division 1074223300 · Dec 18, 2003
Continuation In Part 1040925400 · Apr 8, 2003
Continuation In Part 1038496700 · Mar 8, 2003
Continuation In Part 1018982400 · Jul 3, 2002
Continuation In Part 1012065500 · Apr 10, 2002
Continuation In Part 0987571900 · Jun 6, 2001
Continuation In Part 0987572100 · Jun 6, 2001
Continuation In Part 0969008400 · Oct 16, 2000
Provisional Application 6042280800 · Oct 31, 2002
Provisional Application 6041980500 · Oct 18, 2002
Related Publication 20070023711A1 · Feb 1, 2007