IP Library Granted Patent US 7,330,265
Granted Patent B2
US 7,330,265 · App. 11/177,070 · Granted Feb 12, 2008

Appearance inspection apparatus and projection method for projecting image of sample under inspection

Assignee: Tokyo Seimitsu Co., Ltd.
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Quick Facts
Patent No.
US 7,330,265
App. No.
11/177,070
Granted
Feb 12, 2008
Kind
B2
Abstract

An object of the present invention is to provide an appearance inspection apparatus that can change the method of illumination, the shape of illumination light, and a spatial filter for the projection of an image of a sample dynamically during inspection, and also to provide a projection method for projecting the image of the sample. Illumination optics 12 and 13 and imaging optics 21 and 22 in the appearance inspection apparatus are respectively configured to form reflecting optical systems with mirror array devices 16 and 26 disposed at points conjugate to the pupil position 8 of an objective lens 3 . The mirror array devices 16 and 26 are controlled in accordance with the field-of-view position of the objective lens 3 on the sample.

Claims (18)

1. An appearance inspection apparatus comprising:

a light source;

an objective lens;

an illumination optical system for projecting illumination light from said light source onto a sample through said objective lens; and

an imaging optical system for projecting an image of said sample, projected through said objective lens, onto an imaging device, wherein

said illumination optical system is configured as a reflecting optical system with a first mirror array device disposed at a point conjugate to a pupil position of said objective lens, and

said imaging optical system is configured as a reflecting optical system with a second mirror array device disposed at a Fourier transformation plane in said imaging optical system.

2. An appearance inspection apparatus as claimed in claim 1 , further comprising mirror controller for controlling said first mirror array device in accordance with a field-of-view position of said objective lens on said sample.

3. An appearance inspection apparatus as claimed in claim 1 , further comprising mirror controller for controlling said second mirror array device in accordance with the field-of-view position of said objective lens on said sample.

4. A method of image projection in an appearance inspection apparatus, the method comprising:

projecting illumination light from a light source onto a sample through an objective lens;

projecting an image of said sample, projected through said objective lens, onto an imaging device;

disposing a first mirror array device at a point conjugate to a pupil position of said objective lens;

filtering said illumination light from said light source through said first mirror array device;

disposing a second mirror array device at a Fourier transformation plane in an imaging optical system; and

filtering the image of said sample projected through said objective lens through said second mirror array device.

5. A method of image projection as claimed in claim 4 , further comprising controlling said first mirror array device in accordance with a field-of-view position of said objective lens on said sample.

6. A method of image projection as claimed in claim 4 , further comprising controlling said second mirror array device in accordance with the field-of-view position of said objective lens on said sample.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2005
From: KUROSAWA, TOSHIRO; YAMAZAKI, SHOHEI; MIYAZAKI, YOKO
To: TOKYO SEIMITSU CO., LTD.
Reel/Frame 016423/0851 →
Priority Claims (1)
JP 2004-202900 · Jul 9, 2004 · national
Continuity (1)
Related Publication 20060007436A1 · Jan 12, 2006