IP Library › Granted Patent US 7,355,187
Granted Patent B2
US 7,355,187 · App. 11/167,179 · Granted Apr 8, 2008

Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate

Assignee: Canon Kabushiki Kaisha
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Quick Facts
Patent No.
US 7,355,187
App. No.
11/167,179
Granted
Apr 8, 2008
Kind
B2
Abstract

An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of radiant energy to the substrate through the first mask, a unit which holds a second mask having an auxiliary pattern for identifying the target mark to be formed on the substrate, and a unit which controls the projecting unit so as to project a pattern of radiant energy to the substrate through the second mask.

Claims (5)

1. An apparatus which transfers a device pattern onto a substrate, said apparatus comprising:

a stage which holds a mask having the device pattern and a target mark pattern;

a reference plate placed on the stage and having an auxiliary pattern for identifying the target mark pattern;

a projection unit which projects the device pattern as well as the target mark pattern; and

a control unit which controls the stage such that the auxiliary pattern is transferred onto the substrate for identifying the target mark pattern.

Priority Claims (1)
JP 2002/160299 · May 31, 2002 · national
Continuity (2)
Division 1044669300 · May 29, 2003
Related Publication 20050242285A1 · Nov 3, 2005