3-Dimensional flash memory device and method of fabricating the same
In an embodiment, a 3-dimensional flash memory device includes: a gate extending in a vertical direction on a semiconductor substrate; a charge storing layer surrounding the gate; a silicon layer surrounding the charge storing layer; a channel region vertically formed in the silicon layer; and source/drain regions vertically formed on both sides of the channel region in the silicon layer. Integration can be improved by storing data in a 3-dimensional manner; a 2-bit operation can be performed by providing transistors on both sides of the gate.
1. A semiconductor device comprising:
a gate extending above a semiconductor substrate along a first direction, wherein the gate includes a sidewall extending along the first direction;
a charge storing layer surrounding the gate;
a silicon layer surrounding the charge storing layer;
a channel region formed in the silicon layer;
source/drain regions formed on both sides of the channel region in the silicon layer along the first direction; and
bit lines connected to the source/drain regions, wherein
at least one of the source/drain regions is disposed between at least one of the bit lines and the sidewall of the gate along a second direction perpendicular to the first direction.
2. The device according to claim 1 , further comprising a word line connected to the gate.
3. The device according to claim 1 , wherein the charge storing layer sequentially includes a first oxide layer, a nitride layer, and a second oxide layer.
4. The device according to claim 1 , further comprising a back bias line connected to the channel region.
5. The device according to claim 1 , wherein the channel region is formed in portions of the silicon layer outside the source/drain regions.
6. The device according to claim 1 , wherein the first direction is a substantially vertical direction or a vertical direction relative to a surface of the semiconductor substrate.
7. The device according to claim 6 , wherein the channel region is located between the source/drain regions along the first direction.
8. A 3-dimensional flash memory device comprising:
a gate extending above a semiconductor substrate along a first direction, wherein the first direction is a substantially vertical direction or a vertical direction relative to a surface of the semiconductor substrate;
a charge storing layer surrounding the gate;
a semiconductor layer surrounding the charge storing layer;
channel regions symmetrically disposed on opposite sides of the gate in the semiconductor layer and isolated from one another along the first direction; and
source/drain regions symmetrically disposed on opposite sides of the gate in the semiconductor layer and spaced apart from one another along the first direction-by the channel regions.
9. The 3-dimensional flash memory device according to claim 8 , further comprising a word line connected to the gate.
10. The 3-dimensional flash memory device according to claim 8 , wherein the charge storing layer sequentially includes a first oxide layer, a nitride layer, and a second oxide layer.
11. The 3-dimensional flash memory device according to claim 8 , further comprising bit lines that extend perpendicular to the gate and that connect to the source/drain regions.
12. The 3-dimensional flash memory device according to claim 11 , wherein
the gate includes a sidewall extending along the first direction, and
at least one of the source/drain regions is disposed between at least one of the bit lines and the sidewall of the gate along a second direction perpendicular to the first direction.
13. The 3-dimensional flash memory device according to claim 8 , further comprising back bias lines connected to the channel regions.
14. The 3-dimensional flash memory device according to claim 8 , wherein the semiconductor layer is a single crystalline silicon layer.
15. The 3-dimensional flash memory device according to claim 8 , wherein the channel regions are interposed between the source/drain regions along the first direction.
16. The 3-dimensional flash memory device according to claim 8 , wherein the source/drain regions are spaced apart so as to be isolated from one another along the first direction.
17. A semiconductor device comprising:
a cylindrical gate that extends from a semiconductor substrate along a first direction, wherein the first direction is a substantially vertical direction or a vertical direction relative to a surface of the semiconductor substrate;
a charge storing layer concentrically surrounding the cylindrical gate;
a semiconductor layer concentrically surrounding the charge storing layer;
channel regions disposed in the semiconductor layer; and
source/drain regions disposed in the semiconductor layer and spaced apart from one another along the first direction by the channel regions, wherein the source/drain regions are spaced apart so as to be isolated from one another along the first direction.
18. The semiconductor device according to claim 17 , wherein the channel regions are interposed between the source/drain regions along the first direction.