Light-emitting device and method of fabricating the same
View Patent ↗A light-emitting device having a structure in which a mask used for forming a film such as an organic compound layer does not come in contact with the pixels in forming the light-emitting elements, and a method of fabricating the same. In fabricating the light-emitting device of the active matrix type, a partitioning wall constituted by a second wiring and a separation portion is formed on the interlayer-insulating film, and the pixels are surrounded by the partitioning wall, preventing the mask from coming into direct contact with the pixels, the mask being used for forming the organic compound layer and the opposing electrode of the light-emitting elements.
1. A method of fabricating a display device comprising:
forming a source region, a drain region and a channel region over a substrate;
forming a gate insulating film over the source region, the drain region and the channel region;
forming a gate electrode and a first wiring;
forming an insulating film over the gate electrode and over the first wiring;
removing a part of the insulating film formed over the first wiring;
forming a metal film over the first wiring and over the insulating film;
forming a separation film over the metal film;
etching the separation film to form a separation portion;
etching the metal film to form a second wiring after forming the separation portion, wherein the second wiring is electrically connected to one of the source region and the drain region; and
forming a light-emitting element electrically connected to the first wiring.
2. A method of fabricating a display device according to claim 1 , wherein the display device is incorporated into an electronic apparatus selected from the group consisting of a digital camera, a notebook-type personal computer, a mobile computer, a portable image-reproducing device equipped with a recording medium, a goggle-type display, a video camera, a portable telephone, a navigation system, a sound reproduction device and a game machine.
3. A method of fabricating a display device according to claim 1 , wherein the separation portion comprises a material that provides an etching rate smaller than that of a material forming the second wiring with respect to an etching solution selected from the group consisting of a hydrofluoric acid, a mixed solution containing a hydrofluoric acid, and a mixed solution of phosphoric acid, nitric acid and acetic acid.
4. A method of fabricating a display device according to claim 1 , wherein the separation portion comprises a material selected from the group consisting of an inorganic material, a metal and an organic resin.
5. A method of fabricating a display device according to claim 1 , wherein the source region, the drain region and the channel region are a source region, a drain region and a channel region of a current control TFT.
6. A method of fabricating a display device according to claim 1 , wherein the light-emitting element comprises an organic compound.
7. A method of fabricating a display device according to claim 1 , wherein the first wiring is an electrode connection wiring.
8. A method of fabricating a display device according to claim 1 , wherein the second wiring is a drain wiring.
9. A method of fabricating a display device according to claim 1 , wherein the first wiring is in contact with the light-emitting element.