Semiconductor devices including transistors having three dimensional channels and methods of fabricating the same

1. A method of forming a semiconductor device, the method comprising:

forming a semiconductor fin on a semiconductor substrate;

forming a gate insulating layer on a surface of the semiconductor fin;

forming a gate conductive layer on the gate insulating layer;

patterning the gate conductive layer to form a gate electrode crossing over the semiconductor fin;

forming a doped region in the semiconductor fin at either side of the gate electrode;

forming an interlayer insulating layer on a surface of the substrate; and

forming a connector region in an opening to be connected to the doped region, the opening penetrating the interlayer insulating layer, wherein a recess region is formed in the doped region connected to the connector region and wherein the connector region contacts an inner surface of the recess region.

2. The method of claim 1 , wherein forming the doped region, the recess region and the opening comprises:

forming the gate insulating layer on a central portion of an upper surface of the semiconductor fin thinner than the gate insulating layer on edges of the upper surface of the semiconductor fin;

after the forming of the gate electrode, etching the thin gate insulating layer and the semiconductor fin provided at either side of the gate electrode by over-etching using a mask pattern used in the patterning of the gate electrode, to form the recess region;

forming the doped region in the semiconductor fin having the recess region provided at either side of the gate electrode; and

patterning the interlayer insulating layer to form an opening exposing at least a portion of the recess region of the doped region, wherein an etch rate of the semiconductor fin is higher than an etch rate of the gate insulating layer during the over-etching.

3. The method of claim 1 , wherein forming of the doped region, the recess region and the opening comprises:

implanting ions into the semiconductor fin at either side of the gate electrode to form the doped region;

patterning the interlayer insulating layer to form the opening exposing the doped region; and

recessing the doped region exposed by the opening so as to form the recess region.

4. The method of claim 1 , wherein the opening is hole-shaped and wherein the connector region is pillar-shaped such that the connector region fills the opening.

5. The method of claim 1 , wherein the opening has a groove-shape parallel to the gate electrode and the connector region is line-shaped such that the connector region fills the opening.

6. The method of claim 1 , wherein forming the gate conductive layer is preceded by:

forming a preliminary floating gate on the gate insulating layer on both side surfaces and an upper surface of the semiconductor fin; and

conformally forming a blocking insulating layer on the substrate including the preliminary floating gate, wherein forming of the gate electrode comprises:

patterning the gate conductive layer, the blocking insulating layer and the preliminary floating gate so as to form a floating gate, a blocking insulating pattern and the gate electrode which are stacked in sequence.

7. The method of claim 1 , wherein forming of the gate insulating layer is preceded by:

recessing a portion of the upper surface of the semiconductor fin to form a pair of channel fins and a channel recess region therebetween, wherein the gate insulating layer is formed on bottom and inner surfaces of the channel recess region and wherein the gate electrode fills the channel recess region and covers the pair of channel fins.

8. A method of forming a semiconductor device, the method comprising:

forming a gate insulating layer on a semiconductor fin formed on a semiconductor substrate;

forming a gate conductive layer on the gate insulating layer;

patterning the gate conductive layer to form a gate electrode crossing over the gate semiconductor fin;

forming a doped region on the semiconductor fin provided at either side of the gate electrode;

forming an interlayer insulating layer on a surface of the semiconductor substrate;

patterning the interlayer insulating layer to expose at least a portion of an upper surface and both side surfaces of the doped region; and

forming a connector region filling an opening.

9. The method of claim 8 , wherein the opening is hole-shaped such that it has a greater width than a width of the doped region parallel to a channel width of the channel region under the gate electrode and wherein the connector region is pillar-shaped such that it fills the opening.

10. The method of claim 8 , wherein the opening has a groove-shape such that it crosses over the doped region parallel to the gate electrode and wherein the connector region is line-shaped such that it fills the opening.

11. The method of claim 8 , wherein forming of the gate conductive layer is preceded by:

forming a preliminary floating gate on the gate insulating layer, the preliminary floating gate covering both side surfaces and an upper surface of the semiconductor fin; and

conformally forming a blocking insulating layer on the substrate including the preliminary floating gate, wherein forming of the gate electrode comprises:

patterning the gate conductive layer, the blocking insulating layer and the preliminary floating gate so as to form a floating gate, a blocking insulating pattern and the gate electrode which are stacked in sequence.

12. The method of claim 8 , wherein forming of the gate insulating layer is preceded by recessing a portion of the upper surface of the semiconductor fin to form a pair of channel fins and a channel recess region therebetween, wherein the gate insulating layer is formed on bottom and inner surfaces of the channel recess region and wherein the gate electrode fills the channel recess region and covers the pair of channel fins.