IP Library › Granted Patent US 7,462,244
Granted Patent B2
US 7,462,244 · App. 10/493,699 · Granted Dec 9, 2008

Device and method for vacuum film formation

Assignee: NEC Corporation
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Quick Facts
Patent No.
US 7,462,244
App. No.
10/493,699
Granted
Dec 9, 2008
Kind
B2
Abstract

A vacuum deposition apparatus is used for deposit evaporated substance from evaporation sources ( 6 a and 6 b ) on the desired position of a flexible substrate ( 1 ). While the flexible substrate ( 1 ) is carried using rollers in a vacuum, shutters ( 8 a and 8 b ) are opened and closed to control the movement of the evaporated substance via openings. A film having a desired shape of pattern is formed on the flexible substrate ( 1 ) with higher controllability.

Claims (10)

1. A vacuum deposition apparatus comprising:

a feed roller for feeding therefrom a substrate;

a take-up roller for winding the substrate fed by said feed roller;

plural evaporation sources that each includes a substance to be evaporated to deposit on the substrate for vacuum deposition;

plural evaporated substance supply members for guiding the evaporated substances to the substrate and being disposed between the evaporation sources and the substrate, wherein the evaporated substance supply members have plural slit openings on a side nearest the substrate; and

plural shutters disposed between respective said evaporated substance supply members and respective said evaporation sources for intermittently blocking movement of the evaporated substances from said evaporation sources to the substrate.

2. The vacuum deposition apparatus according to claim 1 , further comprising a guide roller between said feed roller and said take-up roller.

3. The vacuum deposition apparatus according to claim 1 , further comprising a dancer roller between said feed roller and said take-up roller.

4. The vacuum deposition apparatus according to claim 1 , further comprising a position sensor between said feed roller and said take-up roller for determining a position of the substrate.

5. The vacuum deposition apparatus according to claim 1 , wherein said evaporation sources include different substances to be evaporated.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2004
From: UTSUGI, KOJI; YAMAMOTO, HIRONORI; MIYACHI, MARIKO; MIURA, TAMAKI; MORI, MITSUHIRO; BANNAI, YUTAKA; YAMAZAKI, IKIKO
To: NEC CORPORATION
Reel/Frame 015872/0265 →
Priority Claims (1)
JP 2001-361709 · Nov 27, 2001 · national
Continuity (1)
Related Publication 20050008778A1 · Jan 13, 2005