IP Library Granted Patent US 7,510,582
Granted Patent B2
US 7,510,582 · App. 11/681,756 · Granted Mar 31, 2009

Method of fabricating thin film battery with annealed substrate

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Quick Facts
Patent No.
US 7,510,582
App. No.
11/681,756
Granted
Mar 31, 2009
Kind
B2
Abstract

A thin film battery manufacturing method comprises annealing a battery substrate to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate. The battery substrate comprises a thickness of less than about 100 microns. After annealing, a plurality of thin films are formed on the annealed battery substrate, the thin films comprising at least one electrolyte between a pair of electrodes, and the thin films adapted to generate or store an electrical charge. The thin films can also be annealed to remove defects in the thin films.

Claims (27)

1. A thin film battery manufacturing method comprising:

(a) annealing a battery substrate comprising mica to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate, the battery substrate comprising a thickness of less than about 100 microns; and

(b) forming a plurality of thin films on the annealed battery substrate, the thin films comprising at least one electrolyte between a pair of electrodes, and the thin films adapted to generate or store an electrical charge.

2. A method according to claim 1 comprising annealing the battery substrate by heating the battery substrate in air to about 400° C.

3. A method according to claim 1 comprising annealing the battery substrate by heating the battery substrate to a temperature from about 150 to about 600° C.

4. A method according to claim 3 comprising annealing the battery substrate by heating the battery substrate for about 10 minutes.

5. A method according to claim 1 further comprising annealing the battery substrate by heating the battery substrate to a temperature that is sufficiently high to eliminate defects.

6. A method according to claim 1 wherein the battery substrate comprises a thickness of less than 25 microns.

7. A method according to claim 1 comprising forming the thin films on the battery substrate by physical or chemical vapor deposition, oxidation, nitridation or electro-plating.

8. A method according to claim 1 comprising heating the battery substrate to a temperature that is sufficiently high to eliminate defects in the thin films formed on the battery substrate such that battery capacity increases by 10 to 20% and the charge and discharge current increases by more than 50%.

9. A method according to claim 1 wherein (b) comprises:

(a) placing the battery substrate in a chamber comprising a target composed of LiCoO 2 ;

(b) introducing a process gas into the chamber;

(c) energizing the process gas by applying a current at a power density level of from about 0.1 to about 20 W/cm 2 to the target, thereby sputtering material from the target to deposit onto the battery substrate; and

(d) exhausting the process gas from the chamber.

10. A method according to claim 9 wherein the chamber comprises a magnetron-sputtering cathode, and the method comprises energizing the process gas by applying a potential across the target and the magnetron-sputtering cathode to form a plasma of the process gas that has an ion flux of from about 0.1 to about 5 mA/cm 2 .

11. A method according to claim 9 comprising maintaining the battery substrate at a potential of from about −5V to about −200 V.

12. A method according to claim 9 further comprising applying a non-uniform magnetic field about the target in the chamber, the non-uniform magnetic field comprising a weaker central magnetic field strength and a surrounding stronger peripheral magnetic field strength.

13. A thin film battery manufacturing method comprising:

(a) depositing a thin film on a battery substrate comprising mica, the battery substrate comprising a thickness of less than 100 microns, and the thin film comprising an electrode; and

(b) annealing the thin film by heating the substrate to a temperature from about 150 to about 600° C., and that is sufficiently high to eliminate defects from the thin film.

14. A method according to claim 13 comprising forming the thin film on the battery substrate by physical or chemical vapor deposition, oxidation, nitridation or electro-plating.

15. A method according to claim 13 comprising annealing the battery substrate to a temperature that is sufficiently high to eliminate defects in the thin films such that battery capacity increases by 10 to 20% and the charge and discharge current increases by more than 50%.

16. A thin film battery manufacturing method comprising:

(a) annealing a battery substrate comprising mica to a temperature at which organic materials are burned off the battery substrate to clean the battery substrate, the battery substrate comprising a thickness of less than about 100 microns;

(b) forming a thin film on the annealed battery substrate, the thin films comprising an electrode; and

(c) annealing the thin film by heating the substrate to a temperature from about 150 to about 600° C., and that is sufficiently high to eliminate defects from the thin film.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 30, 2022
From: FRONT EDGE TECHNOLOGY, INC.
To: KLA CORPORATION
Reel/Frame 061916/0676 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 2, 2007
From: KRASNOV, VICTOR; NIEH, KAI-WEI; TING, SU-JEN
To: FRONT EDGE TECHNOLOGY, INC.
Reel/Frame 020063/0992 →
Continuity (4)
Continuation 1100736200 · Dec 7, 2004
Continuation 1063920600 · Aug 12, 2003
Division 0965601200 · Sep 7, 2000
Related Publication 20070166612A1 · Jul 19, 2007