IP Library Granted Patent US 7,511,989
Granted Patent B2
US 7,511,989 · App. 11/683,722 · Granted Mar 31, 2009

Memory cells in double-gate CMOS technology provided with transistors with two independent gates

Assignee: Commissariat a l'Energie Atomique
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Quick Facts
Patent No.
US 7,511,989
App. No.
11/683,722
Granted
Mar 31, 2009
Kind
B2
Abstract

This invention relates to an improved microelectronic RAM memory device, provided with 4T or 6T cells made using the double gate technology and each associated with two word lines.

Claims (31)

1. A random access memory cell, comprising:

a first plurality of double gate transistors; and

a first asymmetric double gate access transistor and a second asymmetric double gate access transistor arranged between a first bit line and a first storage node, and between a second bit line and a second storage node respectively, a first gate of the first access transistor and a first gate of the second access transistor being connected to a first word line capable of carrying a bias signal, a second gate of the first access transistor and a second gate of the second access transistor being connected to a second word line capable of carrying another bias signal, wherein

the first access transistor and the second access transistor with asymmetric double-gate comprise an upper gate and a lower gate respectively, and said second word line is dedicated solely to write operations into the cell, the second word line being connected to the lower gate of the access transistors.

2. The random access memory cell, as claimed in claim 1 , the first plurality of transistors comprising:

a first double gate load transistor and a second double gate load transistor, the two gates of the first load transistor being connected to each other, and the two gates of the second load transistor also connected to each other; and

a first double gate conduction transistor and a second double gate conduction transistor, the two gates of the first conduction transistor being connected to each other, the two gates of the second conduction transistor also being connected to each other.

3. The random access memory cell, as claimed in claim 1 , the first plurality of transistors comprising:

a first double gate load transistor and a second double gate load transistor, the two gates of the first load transistor being connected to each other, and the two gates of the second load transistor also being connected to each other;

or a first double gate conduction transistor and a second double gate conduction transistor, the two gates of each of the conduction transistors being connected to each other, the two gates of the first conduction transistor being connected to each other, the two gates of the second conduction transistor also being connected to each other.

4. The random access memory cell, as claimed in either claim 1 , 2 or 3 , that may adopt a retention mode in which the first word line and the second word line are connected respectively to a first retention potential and a second retention potential respectively, the first retention potential and the second retention potential being designed to block the first access transistor and the second access transistor.

5. The random access memory (RAM) cell as claimed in claim 4 , the first retention potential and the second retention potential being equal.

6. The random access memory (RAM) cell, as claimed in claim 5 , that can be used in a write mode in which the first word line and the second word line are at a first write potential and a second write potential respectively, the first write potential and the second write potential being designed to make the first access transistor and the second access transistor conducting or saturated.

7. The random access memory (RAM) cell, as claimed in claim 6 , the first write potential and the second write potential being equal.

8. The random access memory (RAM) cell, as claimed in claim 6 , that can adopt a read mode in which the first word line and the second word line are equal to a first read potential and a second read potential respectively, the first read potential and the second read potential being different.

9. The random access memory (RAM) cell, as claimed in claim 8 , the first read potential and the second read potential being less than the first write potential and the second write potential respectively.

10. A microelectronic device with a random access memory (RAM), comprising a plurality of cells as claimed in claim 1 .

11. The random access memory cell according to claim 1 , wherein

a first voltage applied to the second word line during a write operation is different from a second voltage applied to said second word line during a read operation or a retention operation.

12. A microelectronic device, comprising:

a plurality of random access memory cells, at least one random access memory cell of the plurality of random access memory cells including

a first plurality of double gate transistors;

a first double gate access transistor and a second double gate access transistor arranged between a first bit line and a first storage node, and between a second bit line and a second storage node respectively, a first gate of the first access transistor and a first gate of the second access transistor being connected to a first word line capable of carrying a bias signal, a second gate of the first access transistor and a second gate of the second access transistor being connected to a second word line capable of carrying another bias signal;

means for selecting a block of cells; and

means for activating word lines, capable of activating one or several word lines in a first block, independently of word lines in a second block, wherein

the cells are arranged in a matrix divided into at least the first block comprising a plurality of word lines, and at least the second block comprising a plurality of word lines.

13. A microelectronic device, comprising a random access memory cell, the random access memory cell including:

a first plurality of double gate transistors;

a first double gate access transistor and a second double gate access transistor arranged between a first bit line and a first storage node, and between a second bit line and a second storage node respectively, a first gate of the first access transistor and a first gate of the second access transistor being connected to a first word line capable of carrying a bias signal, a second gate of the first access transistor and a second gate of the second access transistor being connected to a second word line capable of carrying another bias signal;

means for forming a first line or column decoder, connected to a first plurality of word lines dedicated to read and write operations; and

means for forming a second column or line decoder connected to a second plurality of word lines dedicated to write operations.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2007
From: THOMAS, OLIVIER; BELLEVILLE, MARC
To: COMMISSARIAT A L'ENERGIE ATOMIQUE
Reel/Frame 018982/0377 →
Priority Claims (1)
FR 06 50824 · Mar 10, 2006 · national
Continuity (1)
Related Publication 20070211519A1 · Sep 13, 2007