Plasma processing method and apparatus
The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
1. A plasma processing method for generating plasma within a vacuum chamber and processing a substrate placed on a substrate electrode within the vacuum chamber, the method comprising:
generating the plasma by supplying a high-frequency power having a frequency of 50 MHz to 3 GHz to a counter electrode provided opposite to the substrate while the interior of the vacuum chamber is controlled to a specified pressure by introducing gas into the vacuum chamber and, simultaneously therewith, evacuating the interior of the vacuum chamber; and
processing the substrate using the generated plasma while controlling plasma distribution on the substrate using a single annular groove formed between the vacuum chamber and an insulating ring for insulating the vacuum chamber and the counter electrode from each other, wherein said insulating ring annularly surrounds the counter electrode, wherein the annular groove being located so that an outer-side face of the annular groove is located inside of and is non-coplanar with an inner surface of a sidewall of the vacuum chamber, and so that the annular groove has a groove width in a range of 3 mm to 50 mm.
2. A plasma processing apparatus comprising:
a vacuum chamber;
a gas supply unit for supplying gas into said vacuum chamber;
an evacuating device for evacuating an interior of said vacuum chamber;
a substrate electrode for placing thereon a substrate within said vacuum chamber;
a counter electrode provided opposite to said substrate electrode;
a high-frequency power supply operable to supply a high-frequency power having a frequency of 50 MHz to 3 GHz to said counter electrode; and
a single annular groove formed between said vacuum chamber and an insulating ring for insulating said vacuum chamber and said counter electrode from each other, wherein said insulating ring annularly surrounds the counter electrode, wherein said annular groove being located so that an outer-side face of said annular groove is located inside of and is non-coplanar with an inner surface of a sidewall of said vacuum chamber, said annular groove having a groove width in a range of 3 mm to 50 mm.
3. The plasma processing method of claim 1 , wherein the single annular groove defines a plasma trap located opposite the substrate.
4. The plasma processing method of claim 1 , further comprising supplying a gas into the vacuum chamber at a location outside of the annular groove such that no gas is introduced directly into the annular groove from outside the vacuum chamber.
5. The plasma processing apparatus of claim 2 , wherein said single annular groove defines a plasma trap located opposite the substrate.
6. The plasma processing apparatus of claim 2 , further comprising a gas inlet for introducing a gas into the vacuum chamber, said gas inlet being located such that no gas is introduced directly into the annular groove from outside the vacuum chamber.
7. The plasma processing apparatus of claim 2 , wherein said vacuum chamber includes an upper wall, said annular groove being located between said upper wall of said vacuum chamber and said insulating ring.
8. The plasma processing method of claim 1 , wherein an entirety of the annular groove is spaced apart from the inner surface of the sidewall of the vacuum chamber.
9. The plasma processing method of claim 1 , wherein the annular groove is located between a surface of an upper wall of the vacuum chamber and the insulating ring.
10. The plasma processing method of claim 9 , wherein the annular groove is located so that a shoulder portion of the upper wall is located between the outer-side face of the annular groove and the inner surface of the sidewall of the vacuum.
11. The plasma processing method of claim 1 , wherein the outer-side face of the annular groove is a surface different from the inner surface of the sidewall of the vacuum chamber.
12. The plasma processing apparatus of claim 2 , wherein an entirety of said annular groove is spaced apart from said inner surface of said sidewall of said vacuum chamber.
13. The plasma processing apparatus of claim 2 , wherein said annular groove is located between a surface of an upper wall of said vacuum chamber and said insulating ring.
14. The plasma processing apparatus of claim 13 , wherein said annular groove is located so that a shoulder portion of said upper wall is located between said outer-side face of said annular groove and said inner surface of said sidewall of said vacuum.
15. The plasma processing apparatus of claim 2 , wherein said outer-side face of said annular groove is a surface different from said inner surface of said sidewall of said vacuum chamber.