Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
A method of forming a film pattern by disposing functional liquid on a substrate includes: forming banks on the substrate; disposing the functional liquid in regions partitioned by the banks; and drying the functional liquid disposed on the substrate. The forming of the banks includes forming a thin film on the substrate, the thin film being made of a material for forming the banks, performing lyophobic treatment on a surface of the thin film, and patterning the thin film into the shapes of the banks.
1. A method of forming a film pattern by disposing functional liquid on a substrate, comprising:
forming a plurality of banks on the substrate, adjacent banks beings separated by a trench having a plurality of first portions including a first width that are each connected by a plurality of second portions having a second width, the second width being greater than the first width and a transition region between the first portions and the second portions being hexagonal in shape when viewed in plan;
disposing the functional liquid in the trench partitioned by the banks; and
drying the functional liquid disposed on the substrate,
wherein the forming of the banks includes:
forming a thin film on the substrate, the thin film being made of a material for forming the banks;
after forming the thin film on the substrate, performing lyophobic treatment on a surface of the thin film; and
after performing the lyophobic treatment on a surface of the thin film, patterning the thin film into the shapes of the banks.
2. The method according to claim 1 ,
wherein the forming of the banks includes performing exposure treatment on the thin film before performing the lyophobic treatment on the surface of the thin film.
3. The method according to claim 1 ,
wherein the material for forming the banks contains one of polysilazane, polysilane, and polysiloxane.
4. The method according to claim 3 ,
wherein the material for forming the banks comprises a photosensitive material containing one of polysilazane, polysilane, and polysiloxane.
5. The method according to claim 1 ,
wherein the functional liquid is disposed in the regions by using a liquid droplet discharging method.
6. The method according to claim 5 ,
wherein each of the regions partitioned by the banks includes first and second portions, the first portion being wider than the second portion.
7. A method of manufacturing a device having a film pattern formed on a substrate,
wherein the film pattern is formed on the substrate by using the method of forming the film pattern according to claim 1 .
8. The method according to claim 7 ,
wherein the film pattern forms a portion of a switching element provided on the substrate.
9. The method according to claim 8 ,
wherein the film pattern forms at least a portion of at least one of a gate wiring line and a gate electrode of the switching element provided on the substrate.
10. A device manufactured by using the method of manufacturing the device according to claim 7 .
11. An electro-optical device comprising the device according to claim 10 .
12. An electronic apparatus comprising the electro-optical device according to claim 11 .