Methods of forming metal layers in the fabrication of semiconductor devices
A metal deposition processing apparatus includes a first processing chamber configured for holding a semiconductor substrate therein. A second processing chamber is configured for holding the semiconductor substrate therein and for forming an upper metal layer thereon. A transfer chamber is connected to the first processing chamber and the second processing chamber. The transfer chamber is configured to transfer the semiconductor substrate between the first processing chamber and the second processing chamber.
1. A method of forming metal layers on a semiconductor substrate comprising:
forming a barrier metal layer on a semiconductor substrate in a first processing chamber using a metal organic chemical vapor deposition (MOCVD) method;
flushing the barrier metal using at least one gas selected from the group consisting of gases containing a halogen group element and gases containing a halogen group element and a transitional metal; and
forming an upper metal layer on the barrier metal layer in the second processing chamber, wherein the barrier metal layer is isolated from an oxygen atmosphere until the step of forming the upper metal layer to reduce oxygen contamination of the barrier metal layer.
2. The method of claim 1 , wherein forming a barrier metal layer includes forming a barrier metal layer of at least one material layer selected from the group consisting of a titanium nitride (TiN) layer, a titanium silicon nitride (TiSiN) layer and a tantalum nitride (TaN) layer.
3. The method of claim 1 , wherein forming a barrier metal layer includes using a TDEAT (tetra(diethylamino)titanium) metal organic precursor.
4. The method of claim 1 , wherein forming a barrier metal layer includes using a TDMAT (tetra(dimethylamino)titanium) metal organic precursor.
5. The method of claim 1 , further comprising isolating the first processing chamber and the second processing chamber from the transfer chamber using a gate valve.
6. The method of claim 1 , wherein forming an upper metal layer includes using a chemical vapor deposition (CVD) technique, an atomic layer deposition (ALD) technique, or a physical vapor deposition (PVD) technique.
7. The method of claim 1 , further comprising heating the semiconductor substrate in a heating chamber connected to the transfer chamber prior to forming the barrier metal layer.
8. The method of claim 1 , further comprising cooling the semiconductor substrate in a cooling chamber connected to the transfer chamber.
9. The method of claim 1 , wherein flushing the barrier metal layer further comprises using at least one of inert gases, a hydrogen gas and a nitrogen gas as a carrier gas.
10. The method of claim 1 , wherein the flushing further comprises flushing the barrier metal layer using a titanium chloride (TiCl 4 ) gas.
11. The method of claim 1 , wherein the barrier metal layer includes a porous structure formed by a metal organic source containing carbon atoms using the MOCVD technique.
12. A method of forming metal layers on a semiconductor substrate comprising:
forming a barrier metal layer on a semiconductor substrate using a metal organic chemical vapor deposition (MOCVD) technique;
flushing the barrier metal layer using at least one gas selected from the group consisting of gases containing a halogen group element and gases containing a halogen group element and a transition metal; and
forming an upper metal layer on the barrier metal layer in the second processing chamber.
13. The method of claim 12 , wherein forming a barrier metal layer includes forming a barrier metal layer of at least one material layer selected from the group consisting of a titanium nitride (TiN) layer, a titanium silicon nitride (TiSiN) layer and a tantalum nitride (TaN) layer.
14. The method of claim 12 , wherein forming a barrier metal layer includes using a TDEAT (tetra(diethylamino)titanium) metal organic precursor.
15. The method of claim 12 , wherein forming a barrier metal layer includes using a TDMAT (tetra(dimethylamino)titanium) metal organic precursor.
16. The method of claim 12 , wherein forming an upper metal layer includes using a chemical vapor deposition (CVD) technique, an atomic layer deposition (ALD) technique, or a physical vapor deposition (PVD) technique.
17. The method of claim 12 , wherein the flushing of the barrier metal layer further comprises using at least one of inert gases, a hydrogen gas and a nitrogen gas as a carrier gas.
18. The method of claim 12 , further comprising flushing the barrier metal layer using a titanium chloride (TiCl 4 ) gas.
19. The method of claim 12 , wherein the barrier metal layer includes a porous structure formed by a metal organic source containing carbon using the MOCVD technique.