Method and system for inspecting surfaces with improved light efficiency
The radiation beam of discrete light source such as LEDs is shaped by a cylindrical lens and a spherical lens to form two perpendicular narrow lines to illuminate a surface. The first line is projected onto a sample surface to improve illumination efficiency, and the second line is projected onto a pupil plane of an imaging lens to improve illumination uniformity. The layout of the LED chip is optimized to match the aspect ratio of the imaging detector. Multiple LEDs at different wavelengths are combined to improve sensitivity. The full surface of the sample is inspected through the relative motion between the sample and the optics.
1. A system for inspecting a surface of a substrate, the system comprising:
a line scan sensor;
an imaging lens; and
an illumination source including a number of light sources at different wavelengths, output lights of the light sources collimated respectively and then combined by at least one dichroic beam splitters, each of the light sources being adjustable to optimize for defect detection sensitivity on the surface of the substrate, the combined light being provided via at least two lenses to illuminate the surface of the substrate being inspected, wherein the two lenses include:
a cylindrical lens and a spherical lens to produce first and second illumination lines from the combined light, the first illumination line projected on the surface and the second illumination line projected in a perpendicular direction at a pupil plane of the imaging lens to achieve both intensity uniformity and angular uniformity across a field of view of the line scan sensor, wherein an image of the surface is focused onto the line scan sensor by the imaging lens.
2. The system as recited in claim 1 , wherein the line scan sensor is a COD or a TDI sensor.
3. The system as recited in claim 1 , further comprising:
an air bearing conveyor transporting the substrate; and a moving mechanism to cause a relative movement of the substrate with respect to the system.
4. The system as recited in claim 3 , further comprising a vacuum preload air bearing chuck to support and stabilize the substrate under the field of view of the line scan sensor.
5. The system as recited in claim 1 , wherein the light sources include at least a first LED to generate a light at wavelength λ 1 and a second LED to generate a light at wavelength λ 2 , the light from the first or second LED is collimated and combined by a dichroic beam splitter.
6. The system as recited in claim 5 , wherein each of the first or second LED includes an LED light emitting area formed by an array of narrow strips, and gaps between the light emitting strips are used for placement of electrodes, an overall area of the light emitting area is optimized to match an aspect ratio of an elongated imaging sensor in the line scan sensor.
7. The system as recited in claim 6 , further including a control unit configured to independently control a corresponding intensity of the light at wavelength λ 1 or λ 2 .
8. The system as recited in claim 6 , wherein the intensity of the light at wavelength λ 1 or λ 2 is adjustable to optimize for defect detection sensitivity based on characteristics of the surface of the substrate.
9. The system as recited in claim 1 , wherein the light sources are arranged substantially in a squared array that is rotated by 45 degrees such that a diagonal direction of the squared array is aligned with a longer axis of the cylindrical lens, as a result, light distribution on the surface of the substrate includes one strong central line and two weaker side lobes.
10. The system as recited in claim 1 , wherein the substrate is one of liquid crystal displays (LCD), flat panel displays (FPD), organic light emitting diode (OLED) substrates, masks and semiconductor wafers.
11. The system as recited in claim 1 , further comprising a dark field illumination positioned at an angle from a normal to the surface.
12. A system for inspecting a surface of a substrate, the system comprising:
a line scan sensor;
an imaging lens;
a front illumination source including a number of light sources at different wavelenths, output lights of the light sources respectively collimated and then combined by at least one dichroic beam splitters, each of the light sources being adjustable to optimize for defect detection sensitivity on the surface of the substrate, the combined light being provided via at least two lenses to illuminate the surface of the substrate being inspected, wherein the two lenses include:
a cylindrical lens and a spherical lens to produce first and second lines from the illumination source, the first line projected on the surface and the second line projected in a perpendicular direction at a pupil plane of the imaging lens to achieve both intensity uniformity and angular uniformity across a field of view of the line scan sensor, and an image of the surface is focused onto the line scan sensor by the imaging lens;
a back illumination source to enhance detection of defects that are otherwise difficult to detect with only the front illumination source; and
at least one vacuum preload air bearing chuck to provide a down force to stabilize the substrate during a high-speed motion of the substrate over air bearings.
13. The system as recited in claim 12 , further comprising a moving mechanism to cause a relative movement of the substrate with respect to an inspection module that includes the line scan sensor; the imaging lens; the front and back illumination sources, and a control unit to control intensity of light sources in the front and back illumination sources.
14. The system as recited in claim 13 , wherein the light sources include at least a first LED to generate a light at wavelength λ 1 and a second LED to generate a light at wavelength λ 2 , the light from the first or second LED is collimated and combined by a dichroic beam splitter.
15. The system as recited in claim 14 , wherein the dichroic beam splitter reflects the light at wavelength λ 2 and transmits the light at wavelength λ 1 .
16. The system as recited in claim 12 , wherein an intensity of the light at wavelength λ 1 or λ 2 is adjustable to optimize for defect detection sensitivity based on characteristics of the surface of the substrate.
17. The system as recited in claim 12 , wherein the light sources in the front illumination source are arranged substantially in a squared array that is rotated by 45 degrees such that a diagonal direction of the squared array is aligned with a longer axis of the cylindrical lens, as a result, light distribution on the surface of the substrate includes one strong central line and two weaker side lobes.
18. The system as recited in claim 12 , wherein the substrate is one of liquid crystal displays (LCD), flat panel displays (FPD), organic light emitting diode (OLED) substrates, masks and semiconductor wafers.
19. The system as recited in claim 12 , further comprising a dark field illumination positioned at an angle from a normal to the surface.