Cleaner for semiconductor devices
View Patent ↗The invention has for its object the provision of a cleaner capable of removing particles and metal impurities present on the surface of a wafer without corrosion of wirings, gates or the like yet at normal temperature in a short period of time and with a one-pack type solution. To accomplish the above object, the invention provides a cleaner that is an aqueous solution containing phosphoric acid, hydrofluoric acid, and ammonia and/or amine, and having a pH ranging from 2 to 12, wherein the aqueous solution comprises 0.5 to 25 mass % of phosphoric acid, 0.1 to 10 mass % of ammonia and/or amine, and 5×10 −3 to 5.0 mass % of hydrofluoric acid.
1. A cleaner that is an aqueous solution containing phosphoric acid, hydrofluoric acid, and ammonia and/or amine and having a pH ranging from 2 to 6, wherein said aqueous solution contains:
0.5 to 25 mass % of phosphoric acid,
0.1 to 10 mass % of ammonia and/or amine, and
0.1 to 5.0 mass % of hydrofluoric acid.
2. The cleaner according to claim 1 , wherein the pH is regulated by phosphoric acid.
3. The cleaner according to claim 1 or 2 , which further includes a surface active agent and/or a chelate agent.
4. The cleaner according to claim 1 , which further includes hydrogen peroxide.
5. The cleaner according to claim 1 , which is used for cleaning off particles and/or metal impurities out of the surface of a semiconductor device substrate.
6. The cleaner according to claim 2 , which further includes hydrogen peroxide.
7. The cleaner according to claim 3 , which further includes hydrogen peroxide.
8. The cleaner according to claim 2 , which is used for cleaning off particles and/or metal impurities out of the surface of a semiconductor device substrate.
9. The cleaner according to claim 3 , which is used for cleaning off particles and/or metal impurities out of the surface of a semiconductor device substrate.
10. The cleaner according to claim 4 , which is used for cleaning off particles and/or metal impurities out of the surface of a semiconductor device substrate.