Single chip data processing device with embedded nonvolatile memory and method thereof
A device is described comprising a substrate of a first conductivity type having a first dopant concentration, a first well formed in the substrate, a second well of the first conductivity type formed in the substrate and being deeper than the first well, the second well having a higher dopant concentration than the first dopant concentration, and a nonvolatile memory cell formed on the second well. A device is described comprising four wells of various conductivity types with a nonvolatile memory cell formed on the second well. A device is described comprising a plurality of wells for isolating transistors of a plurality of voltage ranges, wherein each one of the plurality of wells contains at least one transistor of a particular voltage range, and wherein transistors of only one of the plurality of voltage ranges are within each of the plurality of wells. A method is described of isolating transistors of a first voltage range from transistors of another voltage range, comprising forming a first well to hold transistors only of a first particular voltage range, and forming a second well to hold transistors only of a second particular voltage range.
1. A method of forming a single chip data processing device, comprising:
forming a first well of a first conductivity type in a substrate of the first conductivity type, the substrate having a first dopant concentration;
forming a second well of the first conductivity type in the substrate, the second well being deeper than the first well, and having a higher dopant concentration than the first dopant concentration;
forming a nonvolatile memory cell on the second well, the nonvolatile memory cell including at least a first transistor; and
forming a second transistor on the second well; wherein
the second transistor is a high-voltage transistor having a same driving voltage range as the first transistor.
2. A single chip data processing device for performing the method of claim 1 .
3. The method of claim 1 , wherein the second transistor is a memory transistor.
4. The method of claim 1 , wherein the second transistor is a selection transistor.
5. The method of claim 1 , further comprising:
forming a third transistor on the second well; wherein
the third transistor is a higher voltage transistor than the first transistor.
6. The method of claim 1 , further comprising:
forming a third transistor on the second well; wherein
the third transistor is an intermediate-voltage transistor.
7. The method of claim 6 , wherein an intermediate-voltage transistor has an associated driving voltage between driving voltages associated with the second transistor of the nonvolatile memory cell and the first transistor.
8. The method of claim 1 , further comprising:
forming a third well in the substrate, the third well being deeper than the first well and of an opposite conductivity type to that of the second well.
9. The method of claim 8 , further comprising:
forming a third transistor on the third well, the third transistor being a higher voltage transistor than the first transistor.
10. The method of claim 9 , wherein the second transistor and the third transistor have the same associated driving voltages.
11. A method of forming a single chip data processing device, comprising:
forming a substrate of a first conductivity type with a first dopant concentration;
forming a first well of the first conductivity type in the substrate;
forming a second well formed in the substrate deeper than the first well and with a higher dopant concentration than the first dopant concentration;
forming a third well of a second conductivity type that is opposite to the first conductivity type;
forming a fourth well of the second conductivity type in the substrate and being shallower than the third well; and
forming a nonvolatile memory cell formed on the second well.
12. A single chip data processing device for performing the method of claim 11 .
13. A method of forming a single chip data processing device, comprising:
forming a first well in a substrate of a first conductivity type having a first dopant concentration, the first well being of the first conductivity type;
forming a second well in the substrate, the second well being of the first conductivity type and being deeper than the first well, the second well having a higher dopant concentration than the first dopant concentration;
forming a nonvolatile memory cell on the second well, the nonvolatile memory cell including at least a first transistor; and
forming a second transistor formed on the first well, wherein
the second transistor is a low-voltage transistor having a lower driving voltage range than the first transistor.
14. The method of claim 13 , further comprising:
forming a third well in the substrate, the third well being deeper than the first well and of an opposite conductivity type to that of the second well.
15. The method of claim 13 , wherein the second transistor is an intermediate-voltage transistor.
16. The method of claim 15 , wherein the forming of the intermediate-voltage transistor comprises:
forming a gate oxide layer on the second well;
forming a gate on the gate oxide layer;
forming a DDD-type source region within the second well to be aligned with a sidewall of the gate; and
forming a DDD-type drain region within the second well to be aligned with the other sidewall of the gate.
17. A method of forming a single chip data processing device, the method comprising:
forming a first well in a substrate of a first conductivity type having a first dopant concentration, the first well being of the first conductivity type;
forming a second well in the substrate, the second well being of the first conductivity type and being deeper than the first well, the second well having a higher dopant concentration than the first dopant concentration;
forming a nonvolatile memory cell on the second well; and
forming a third well in the substrate, the third well being deeper than the first well and of an opposite conductivity type to that of the second well.
18. The method of claim 17 , wherein the nonvolatile memory cell includes at least a first transistor, the method further comprising:
forming a low-voltage transistor on the first well, the low-voltage transistor having a driving voltage that is lower than a driving voltage associated with the first transistor.
19. The method of claim 17 , further comprising:
forming a high-voltage transistor on the third well.
20. A method of forming a single chip data processing device, the method comprising:
forming a first well in a substrate of a first conductivity type, the substrate having a first dopant concentration, and the first well being of the first conductivity type;
forming a second well of the first conductivity type in the substrate, the second well being deeper than the first well, and having a higher dopant concentration than the first dopant concentration;
forming a nonvolatile memory cell on the second well; and
forming a transistor on the substrate;
wherein the doping profile of the first well is identical to that of a field isolation region of the transistor.