IP Library › Granted Patent US 7,625,642
Granted Patent B2
US 7,625,642 · App. 10/529,369 · Granted Dec 1, 2009

Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating

Assignees: Hitachi Chemical Co., Ltd; National Institute of Advanced Industrial Science and Technology
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Quick Facts
Patent No.
US 7,625,642
App. No.
10/529,369
Granted
Dec 1, 2009
Kind
B2
Abstract

Interlayer insulating films 5,7 (insulating films) provided in a memory capacitor cell 8 are formed between a gate electrode 3 and a counter electrode 8 C formed on a silicon wafer 1. The interlayer insulating films 5,7 comprise a borazine-based resin, having a specific dielectric constant of no greater than 2.6, a Young's modulus of 5 GPa or greater and a leak current of no greater than 1×10 −8 A/cm 2 .

Claims (20)

1. A composite insulating film comprising:

a first insulating film comprising a siloxane resin, and

a second insulating film formed on the first insulating film and comprising a compound having a borazine skeleton in a molecular structure thereof.

2. A composite insulating film according to claim 1 ,

wherein the first insulating film is composed of a siloxane resin composition comprising a siloxane resin obtained by hydrolytic condensation of a compound represented by the following formula (1):

X 1 n SiX 2 4-n   (1)

where

X 1 represents an H atom, an F atom, a group containing a B atom, N atom, Al atom, P atom, Si atom, Ge atom or Ti atom, or an organic group of 1 to 20 carbons,

X 2 represents a hydrolyzable group, and

n represents an integer of 0-2, with the proviso that when n is 2, each X 1 may be the same or different, and when n is 0-2, each X 2 may be the same or different.

3. A composite insulating film according to claim 1 , wherein the compound having a borazine skeleton in a molecular structure thereof has a repeating unit represented by the following formula (2):

where

R 1 represents alkyl, aryl, aralkyl or hydrogen,

R 2 represents alkyl, aryl, aralkyl or hydrogen,

R 3 and R 4 represent identical or different monovalent groups selected from among alkyl, aryl, aralkyl and hydrogen,

R 5 represents a substituted or unsubstituted aromatic divalent group, an oxypoly (dimethylsiloxy) group or oxygen,

R 6 represents alkyl, aryl, aralkyl or hydrogen,

a represents a positive integer, b represents 0 or a positive integer, p represents 0 or a positive integer, and q represents 0 or a positive integer.

4. An electronic part provided with a composite insulating film according to claim 1 ,

wherein the composite insulating film is formed on a substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 5, 2005
From: MATSUTANI, HIROSHI; KAJI, MAKOTO; ABE, KOICHI; UCHIMARU, YUKO
To: HITACHI CHEMICAL CO., LTD.; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
Reel/Frame 017505/0484 →
Priority Claims (8)
JP 2002-281989 · Sep 26, 2002 · national
JP 2002-282004 · Sep 26, 2002 · national
JP 2002-282005 · Sep 26, 2002 · national
JP 2002-282043 · Sep 26, 2002 · national
JP 2003-317566 · Sep 9, 2003 · national
JP 2003-317568 · Sep 9, 2003 · national
JP 2003-317572 · Sep 9, 2003 · national
JP 2003-317573 · Sep 9, 2003 · national
Continuity (1)
Related Publication 20060110610A1 · May 25, 2006