Method for manufacturing carbon nanotube composite material
View Patent ↗A method for manufacturing the carbon nanotube composite material includes the steps of: providing a substrate, the substrate having a surface; forming a catalyst film in a special predetermined pattern on the surface of the substrate; forming a carbon nanotube array on the catalyst film to obtain the carbon nanotube array having a special predetermined pattern; providing a pair of protective layers, the protective layers being attached on a corresponding portion of ends of CNT array; filling clearances existing among CNTs of the CNT array and between the two protective layers with a matrix material; and removing the protective layers from CNT array.
1. A method for manufacturing a carbon nanotube composite material, comprising the steps of:
providing a substrate, the substrate having a surface;
forming a catalyst film on the surface of the substrate, the catalyst film including a first portion having a first shape and a second portion having a second shape different from the first shape, the first portion being spaced from the second portion;
forming a first carbon nanotube array on the first portion of the catalyst film to obtain the first carbon nanotube array having the first shape and a second carbon nanotube array on the second portion of the catalyst film to obtain the second carbon nanotube array having the second shape, the first and second carbon nanotube arrays defining a top end portion and a bottom end portion, the bottom end portion being attached to the substrate, the first and second carbon nanotube arrays having a plurality of clearances among neighboring carbon nanotubes of the first and second carbon nanotube arrays;
attaching a protective layer on the top end portion of the first and second carbon nanotube arrays;
filling clearances among the carbon nanotubes with a matrix material; and
removing the first protective layer and the substrate from the first and second carbon nanotube arrays so as to expose the top end portion and the bottom end portion of the first and second carbon nanotube arrays.
2. The method as claimed in claim 1 , further comprising the step of etching the matrix material adjacent the top end portion and the bottom end portion of the first and second carbon nanotube arrays for further exposing the two end portions thereof.
3. The method as claimed in claim 1 , wherein the first protective layer comprises a polyester film.
4. The method as claimed in claim 3 , wherein the first protective layer further comprises a pressure sensitive adhesive layer.
5. The method as claimed in claim 1 , wherein the step of attaching the first protective layer comprises the steps of placing the first protective layer on the top end portion of the first and second carbon nanotube arrays; and pressing the first protective layer into the top end portion of the first and second carbon nanotube arrays.
6. The method as claimed in claim 1 , wherein the clearances are further defined between the substrate and the first protective layer.
7. The method as claimed in claim 1 , wherein the matrix material is selected from the group consisting of silica gel, polyethylene glycol, polyester, epoxy resin, and an acrylic.
8. The method as claimed in claim 1 , wherein before filling with the matrix material, further comprising the steps of:
removing the substrate from the bottom end portion of the first and second carbon nanotube arrays; and
forming a second protective layer on the bottom end portion of the first and second carbon nanotube arrays.
9. The method as claimed in claim 8 , wherein the second protective layer comprises a polyester film.
10. The method as claimed in claim 8 , wherein the second protective layer further comprises a pressure sensitive adhesive layer.
11. The method as claimed in claim 1 , wherein the filling of clearances is achieved by an injection molding process.
12. The method as claimed in claim 1 , further includes etching the first and second surface of the matrix material via reactive ion etching.
13. The method as claimed in claim 12 , wherein the reactive ion etching is carried out using O 2 plasma.
14. The method as claimed in claim 13 , wherein the reactive ion etching is carried out at pressure of about 6 pascals.
15. The method as claimed in claim 13 , wherein the reactive ion etching is carried our wits power of about 150 watts.
16. The method as claimed in 1 , wherein a method for filling clearances among the carbon nanotubes with a matrix material includes:
immersing the first and carbon nanotube arrays with attached protective layer into a melt or solution of the matrix material;
taking out the first and second carbon nanotube arrays;
curing the matrix material amount the clearance in vacuum to cause the matrix material to become soft and elastic.
17. The method as claimed in claim 16 , wherein a mass percent of the carbon nanotubes in the carbon nanotube composite material is about 5%.
18. The method as claimed in claim 1 , wherein the first shape is rectangle and the second shape is a curve.
19. The method as claimed in claim 18 , wherein the second shape is a circle.
20. The method as claimed in claim 1 , wherein the first and second carbon nanotube arrays are connected together by the matrix material.