Crystallized glass, and method for producing crystallized glass

1. Crystallized glass comprising, in percent by mass:

SiO 2 +Al 2 O 3 +P 2 O 5 : from 86.0 to 89.0%;

TiO 2 +ZrO 2 : from 3.0% to less than 4.3%;

P 2 O 5 /SiO 2 : from 0.1495 to 0.1720; and

P 2 O 5 /Al 2 O 3 : from 0.330 to 0.390,

wherein the crystal precipitation peak temperature width obtained in differential thermal analysis of an amorphous glass or an amorphous glass precursor, is at least 22° C.

2. Crystallized glass or an claimed in claim 1 , wherein the crystal precipitation peak temperature width is at least 22° C. and at most 45° C.

3. Crystallized glass as claimed in claim 1 , which further contains an Li 2 O component (as oxide).

4. Crystallized glass as claimed in claim 1 , wherein the crystal precipitation peak temperature obtained in differential thermal analysis of the amorphous glass or the amorphous glass precursor, is within a range of from 950° C. to 1050° C.

5. Crystallized glass as claimed claim 1 , wherein the content of the Ti 2 component is within a range of from 1.6 to 3.0% and the content of the ZrO 2 component is within a range of from 1.3 to 2.5%, in terms of percent by mass of the oxide.

6. Crystallized glass as claimed in claim 1 , which contains β-quartz (β-SiO 2 ) and/or β-quartz solid solution (β-SiO 2 solid solution) as a main crystal phase thereof.

7. Crystallized glass as claimed in claim 1 , having an amount of OH molecules contained in the amorphous glass or the amorphous glass precursor of at most 700 ppm.

8. Crystallized glass as claimed in claim 1 , having a mean crystal particle size of a precipitated crystal phase within a range of from 5 to 200 nm.

9. Crystallized glass as claimed in claim 1 , wherein the maximum temperature in thermal treatment for crystallization is from 750 to 850° C.

10. Crystallized glass as claimed in claim 1 , of which the average linear thermal expansion coefficient within a temperature range of from 0 to 50° C. is within 0.0±0.5 (10 −7 ° C. −1 ) and (maximum value−minimum value) of ΔL/L is within a range of 10×10 −7 .

11. Crystallized glass as claimed in claim 1 , obtained through thermal treatment for crystallization of a starting glass that contains in percent by mass SiO 2 from 50 to 62%.

12. Crystallized glass as claimed in claim 3 , which contains the Li 2 O component in an amount of from 3 to 5% in terms of percent by mass of the oxide.

13. Crystallized glass as claimed in claim 1 , which contains the following components in the amount indicated below in terms of percent by mass of the oxide:

MgO, from 0 to 4% and/or

ZnO, from 0 to 4% and/or

CaO, from 0 to 4% and/or

BaO, from 0 to 4%.

14. Crystallized glass as claimed in claim 1 , which contains the following components in the amount indicated below in terms of percent by mass of the oxide:

SnO 2 , from 0.01 to 5.0% and/or

CeO 2 , from 0.01 to 5.0%.

15. Crystallized glass as claimed in claim 1 , which contains at least one or more components selected from a fluoride component, a sulfate component, a chloride component, an MnO 2 component (as oxide), a WO 3 component (as oxide), a Ta 2 O 5 component (as oxide) and an Nb 2 O 5 component (as oxide).

16. Crystallized glass as claimed in claim 1 , which does not substantially contain PbO, Na 2 O and K 2 O components (as oxides).

17. The crystallized glass of claim 1 , wherein the glass is included in a mask for lithography.

18. The crystallized glass of claim 1 , wherein the glass is included in an optical reflection mirror for lithography.

19. The crystallized glass of claim 1 , wherein the glass is included in a wafer stage or reticule stage for lithography.

20. The crystallized glass of claim 1 , wherein the glass is included in a precision instrument.