IP Library › Granted Patent US 7,659,966
Granted Patent B2
US 7,659,966 · App. 11/366,580 · Granted Feb 9, 2010

Container and method of transporting substrate using the same

Assignee: Canon Kabushiki Kaisha
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Quick Facts
Patent No.
US 7,659,966
App. No.
11/366,580
Granted
Feb 9, 2010
Kind
B2
Abstract

An exposure apparatus for performing exposure of a substrate to light via a reticle. The apparatus includes a first stage configured to hold a chuck. The chuck has a support base with an electrode, and forms a container, for one of the substrate and the reticle, together with a cover. The container electrostatically chucks the one on the support base by the electrode. A transporter transports the container in which the one is contained, and loads the chuck, which chucks the one, on the first stage without the cover. A second stage holds the other of the substrate and the reticle. The apparatus obtains a first positional shift amount between the chuck and the one chucked on the chuck before the transportation by the transporter, to measure a second positional shift amount between a reference mark on the chuck held by the first stage and a reference mark on the second stage, and corrects positions of the first and second stages based on the first and second positional shift amounts, to perform the exposure.

Claims (13)

1. An exposure apparatus for performing exposure of a substrate to light via a reticle, the apparatus comprising:

a first stage configured to hold a chuck, the chuck having a support base with an electrode, the chuck being configured to form a container, for the reticle, together with a cover, the container being configured to electrostatically chuck the reticle on the support base by the electrode;

a transporter configured to transport the container in which the reticle is contained, and to load the chuck, which chucks the reticle, on the first stage without the cover; and

a second stage configured to hold the other of the substrate,

wherein the apparatus is configured to obtain a first positional shift amount between the chuck and the reticle chucked on the chuck before the transportation by the transporter, to measure a second positional shift amount between a reference mark on the chuck held by the first stage and a reference mark on the second stage, and to correct positions of the first and second stages based on the first and second positional shift amounts, to perform the exposure.

2. An apparatus according to claim 1 , wherein the apparatus is configured to perform one of evacuating the container and filling the container with an inert gas via a port included in the container.

3. An apparatus according to claim 1 , wherein the apparatus is configured to supply power to the chuck.

4. An apparatus according to claim 1 , wherein the transporter includes a kinematic coupling mechanism to be coupled to the container.

5. An apparatus according to claim 1 , wherein the apparatus is configured to align the chuck with the first stage.

6. A method of manufacturing a device, the method comprising steps of:

exposing a substrate to light using an exposure apparatus defined in claim 1 ;

developing the exposed substrate; and

processing the developed substrate to manufacture the device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 3, 2006
From: MATSUMOTO, KEN
To: CANON KABUSHIKI KAISHA
Reel/Frame 017644/0800 →
Priority Claims (1)
JP 2005-193084 · Jun 30, 2005 · national
Continuity (1)
Related Publication 20070002516A1 · Jan 4, 2007