IP Library › Granted Patent US 7,659,979
Granted Patent B2
US 7,659,979 · App. 11/869,969 · Granted Feb 9, 2010

Optical inspection apparatus and method

Assignee: KLA-Tencor Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,659,979
App. No.
11/869,969
Granted
Feb 9, 2010
Kind
B2
Abstract

Performing modulation spectroscopy by directing a probe beam and a pump beam at a strained semiconductor sample, modulating the pump beam, and reflecting the probe beam into a detector. The detector produces a direct current signal proportional to reflectance R of the probe beam and an alternating current signal proportional to the modulation of the reflectance ΔR of the probe beam. Both R and ΔR are measured at a multiplicity of probe beam photon energies, to provide a spectrum having at least one line shape. The spectrum is analyzed to measure energy differences between interband electronic transitions of the sample, and the strain of the sample is determined from the energy differences.

Claims (11)

1. A method for modulation spectroscopy of a semiconductor sample, the method comprising the steps of:

irradiating for an irradiation time at least a location on the sample at a radiation intensity and a radiation wavelength sufficient to cause a change in the sample for at least an enhanced measurement time,

halting the irradiation of the sample at the end of the irradiation time,

directing an incident probe beam at the location on the sample during the enhanced measurement time to produce a reflected probe beam,

directing a modulated pump beam at the location on the sample during the enhanced measurement time, thereby causing a modulation of the reflected probe beam,

receiving the reflected probe beam with a detector that generates as output a direct current signal that is proportional to an intensity of the reflected probe beam and an alternating current signal that is proportional to the modulation of the reflected probe beam, and

analyzing at least a portion of the output generated during the enhanced measurement time but not during the irradiation time to determine properties of the sample.

2. The method of claim 1 , wherein the sample is irradiated during the irradiation time by at least one of the probe beam, the pump beam, and a beam other than either the probe beam or the pump beam.

3. The method of claim 1 , wherein the changes are transient.

4. The method of claim 1 , wherein the changes are permanent.

5. The method of claim 1 , wherein the sample is irradiated with at least one of ultraviolet, infrared, and visible radiation.

Continuity (2)
Provisional Application 6085200700 · Oct 17, 2006
Related Publication 20080218741A1 · Sep 11, 2008