System and method for increasing the emissivity of a material
A system and method is disclosed for increasing the emissivity of solid materials, wherein first the surface of the material is mechanically worked to create micro-level defects, and then etched to create a deep micro-rough surface morphology. In this manner, higher efficiencies and lower energy consumption can be obtained when these modified materials are used for heating elements. Heating elements made in accordance with this process thus operate at lower temperatures with longer lifetimes, when the improved heating elements are used with various heating devices.
1. A method of increasing the emissivity of a refractory metal material, comprising:
mechanically working at least one surface of the refractory metal material to locally deform the metal and create micro-level defects; and,
etching the worked surface of the refractory metal material so as to preferentially remove metal at the defects and thereby increase its emissivity substantially without introduction of additional chemical elements into the refractory metal, the preferential removal of metal at the defects creating a microscopic network of grooves on the surface,
wherein the network of grooves is exposed on the surface, wherein the emissivity of the refractory metal is increased by the network of grooves exposed on the surface, and wherein the refractory metal is a radiant heating element or a component of a semiconductor reactor.
2. The method of claim 1 , wherein the mechanical working includes mechanically roughening the surface.
3. The method as claimed in claim 1 wherein said mechanical working includes engaging the surface by contacting the surface with a tool.
4. The method of claim 1 , wherein the mechanical working includes contacting the surface with a particulate medium.
5. The method as claimed in claim 1 , wherein the mechanical working includes shot peening the surface.
6. The method of claim 1 , wherein the mechanical working includes contacting the surface with one or more jets of a liquid.
7. The method of claim 1 , wherein the etching is performed by contacting the worked surface with a plasma.
8. The method of claim 1 , wherein the refractory metal comprises rhenium.
9. The method of claim 1 , wherein the refractory metal comprises molybdenum.
10. The method of claim 1 , wherein the refractory metal comprises tungsten.
11. The method of claim 1 , wherein the refractory metal comprises an alloy including niobium.
12. The method of claim 1 , wherein the etching is performed by contacting the worked surface with a liquid.
13. The method of claim 12 , wherein the liquid is an acid.
14. The method of claim 13 , wherein the acid is nitric acid.