Etching method and apparatus

1. An etching method of performing etching on an etching target film of a substrate by using a processing gas which is a gaseous mixture including a first gas containing halogen and carbon and having a carbon number of two or less per molecule and a second gas containing halogen and carbon and having a carbon number of three or more per molecule, and a gas supply unit for supplying the processing gas toward the substrate from a central portion and a peripheral portion of the gas supply unit, independently, the central and the peripheral portion respectively facing the central and the periphery part of the substrate, the method comprising the step of:

performing etching on the etching target film of the substrate while supplying the processing gas from the gas supply unit,

wherein a mixing ratio of the first gas to the second gas in the central portion is equal to that in the peripheral portion, and a total number of halogen atoms supplied along with the first gas and a total number of halogen atoms supplied along with the second gas are calculated based on the mixing ratio; and

if the total number of the halogen atoms supplied along with the first gas is greater than that of the halogen atoms supplied along with the second gas, the processing gas is supplied such that a flow rate of the gaseous mixture per unit area of a gas supply surface of the gas supply unit is greater in the central portion than in the peripheral portion, and if the total number of the halogen atoms supplied along with the first gas is smaller than that of the halogen atoms supplied along with the second gas, the processing gas is supplied such that a flow rate of the gaseous mixture per unit area of a gas supply surface of the gas supply unit is greater in the peripheral portion than in the central portion.

2. The etching method of claim 1 , wherein the step of supplying the processing gas from the gas supply unit such that a supply amount of the gaseous mixture including the first gas and the second gas is greater or smaller in the central portion than in the peripheral portion is performed by controlling at least one of a flow rate of the processing gas and a dilution rate of the processing gas diluted with dilution gas.

3. The etching method of claim 1 , wherein the first gas is at least one of CH 2 F 2 gas, CHF 3 gas, CF 4 gas and C 2 F 6 gas.

4. The etching method of claim 1 , wherein the second gas is at least one of C 3 F 8 gas, C 4 F 8 gas, C 4 F 6 gas and C 5 F 8 gas.

5. An etching method of performing etching on an etching target film of a substrate by using a processing gas which is a gaseous mixture including a first gas containing halogen and carbon and having a carbon number of two or less per molecule and a second gas containing halogen and carbon and having a carbon number of three or more per molecule, and a gas supply unit for supplying the processing gas toward the substrate from a central portion and a peripheral portion of the gas supply unit, independently, the central and the peripheral portion respectively facing the central and the periphery part of the substrate, the method comprising the step of:

performing etching on the etching target film of the substrate while supplying the processing gas from the gas supply unit,

wherein a first processing gas produced by mixing the first gas with the second gas at a first mixing ratio is supplied to the central portion of the gas supply unit, a second processing gas produced by mixing the first gas with the second gas at a second mixing ratio is supplied to the peripheral portion of the gas supply unit, and a total number of halogen atoms supplied along with the first gas and a total number of halogen atoms supplied along with the second gas are calculated based on the first and second mixing ratios; and

if the total number of the halogen atoms supplied along with the first gas is greater than that of the halogen atoms supplied along with the second gas, the processing gas is supplied such that a flow rate of the first processing gas is greater than that of the second processing gas per unit area of the gas supply surface of the gas supply unit, and if the total number of the halogen atoms supplied along with the first gas is smaller than that of the halogen atoms supplied along with the second gas, the processing gas is supplied such that a flow rate of the first processing gas is smaller than that of the second processing gas per unit area of the gas supply surface of the gas supply unit.

6. An etching method of performing etching on an etching target film of a substrate by using a processing gas which is a gaseous mixture including a first gas containing halogen and carbon and having a carbon number of two or less per molecule and a second gas containing halogen and carbon and having a carbon number of three or more per molecule, and a gas supply unit for supplying the processing gas toward the substrate from a central portion and a peripheral portion of the gas supply unit, independently, the central and the peripheral portion respectively facing the central and the periphery part of the substrate, the method comprising the step of:

performing etching on the etching target film of the substrate while supplying the processing gas from the gas supply unit such that a flow rate of the first gas per unit area of the gas supply surface of the gas supply unit is greater in the central portion than in the peripheral portion and a flow rate of the second gas per unit area of the gas supply surface of the gas supply unit is greater in the peripheral portion than in the central portion.

7. The etching method of claim 6 , wherein the step of supplying the processing gas from the gas supply unit such that a supply amount of the first gas is greater in the central portion than in the peripheral portion is performed by controlling at least one of a flow rate of the first gas and a dilution rate of the first gas diluted with a dilution gas.

8. The etching method of claim 6 , wherein the step of supplying the processing gas from the gas supply unit such that a supply amount of the second gas is greater in the peripheral portion than in the central portion is performed by controlling at least one of a flow rate of the second gas and a dilution rate of the second gas diluted with a dilution gas.

9. An etching method of performing etching on an etching target film of a substrate by using a processing gas which is a gaseous mixture including a first gas containing halogen and carbon and having a carbon number of two or less per molecule and a second gas containing halogen and carbon and having a carbon number of three or more per molecule, and a gas supply unit for supplying the processing gas toward the substrate from a central portion and a peripheral portion of the gas supply unit, independently, the central and the peripheral portion respectively facing the central and the periphery part of the substrate, the method comprising the step of:

performing etching on the etching target film of the substrate while supplying the processing gas from the gas supply unit

wherein if a supply amount of the first gas in the central portion of the gas supply unit is equal to that in the peripheral portion thereof, the processing gas is supplied such that a flow rate of the second gas per unit area of the gas supply surface of the gas supply unit is greater in the peripheral portion than in the central portion, and

if a supply amount of the second gas in the central portion of the gas supply unit is equal to that in the peripheral portion thereof, the processing gas is supplied such that a flow rate of the first gas per unit area of the gas supply surface of the gas supply unit is greater in the central portion than in the peripheral portion.

10. An etching method of performing etching on an etching target film of a substrate by using a processing gas which is a gaseous mixture including a first gas containing halogen and carbon and having a carbon number of two or less per molecule and a second gas containing halogen and carbon and having a carbon number of three or more per molecule, and a gas supply unit for supplying the processing gas toward the substrate from a central portion and a peripheral portion of the gas supply unit, independently, the central and the peripheral portion respectively facing the central and the periphery part of the substrate, the method comprising the step of:

setting a composition and an amount of the processing gas supplied from the gas supply unit,

wherein a total number of halogen atoms supplied along with the first gas and a total number of halogen atoms supplied along with the second gas are calculated based on the composition and the amount; and

if the total number of the halogen atoms supplied along with the first gas is greater than that of the halogen atoms supplied along with the second gas, the processing gas is set such that a total number of halogen atoms per unit area of the gas supply surface of the gas supply unit per unit time is greater in the central portion than in the peripheral portion, and if the total number of the halogen atoms supplied along with the first gas is smaller than that of the halogen atoms supplied along with the second gas, the processing gas is supplied such that the total number of halogen atoms per unit area of the gas supply surface of the gas supply unit per unit time is greater in the peripheral portion than in the central portion.