Carriers for hypochlorous acid vapor
This invention relates to particulate forms of carrier materials containing an oxidant, especially hypohalite or hypohalous acid, especially a dry particulate form of dilute or concentrated hypochlorite and hypochlorous acid compositions. The invention also relates to uses for these particles, such as for generating hypochlorous acid vapor to control the growth of mold or bacteria, to deactivate allergens and allergen causing agents, and to control odors.
1. A method of controlling the growth of mold, biofilm, or bacteria comprising the steps of:
a. placing a composition comprising at least one hypochlorous acid generating particle in a confined space;
b. allowing hypochlorous acid vapor from the particle to contact the mold or bacteria; and
c. inhibiting the growth of mold, biofilm, or bacteria;
d. wherein the particle comprises a carrier and an oxidant; and
e. wherein the ratio of generated hypochlorous acid vapor to chlorine vapor is 250 or greater.
2. The method of claim 1 , wherein the oxidant is selected from the group consisting of hypochlorite, hypochlorous acid, and combinations thereof.
3. The method of claim 1 , wherein the carrier is selected from the group consisting of precipitated silica, precipitated silicate, and mixtures thereof.
4. The method of claim 1 , wherein the composition is placed in a laundry appliance to control biofilm.
5. The method of claim 1 , wherein the carrier has an absorbency of 200 ppm hypochlorite solution of greater than 3.
6. The method of claim 1 , wherein the particle is contained within a vapor permeable pouch.
7. A method of deactivating allergens comprising the steps of:
a. placing a composition comprising at least one hypochlorous acid generating particle in a confined space;
b. allowing hypochlorous acid vapor from the particle to contact an allergen or allergen generating species; and
c. deactivating the allergen or allergen generating species;
d. wherein the particle comprises a carrier and an oxidant; and
e. wherein the ratio of generated hypochlorous acid vapor to chlorine vapor is 250 or greater.
8. The method of claim 7 , wherein the oxidant is selected from the group consisting of hypochlorite, hypochlorous acid, and combinations thereof.
9. The method of claim 7 , wherein the carrier is selected from the group consisting of precipitated silica, precipitated silicate, and mixtures thereof.
10. The method of claim 7 , wherein the carrier has an absorbency of 200 ppm hypochlorite solutions of greater than 3.
11. The method of claim 7 , wherein the particle is contained within a vapor permeable pouch.
12. A method of controlling odors comprising the steps of:
a. placing a composition comprising at least one hypochlorous acid generating particle in a confined space;
b. allowing hypochlorous acid vapor from the particle to contact an odor-causing substance; and
c. inactivating the odor-causing substance;
d. wherein the particle comprises a carrier and an oxidant; and
e. wherein the ratio of generated hypochlorous acid vapor to chlorine vapor is 250 or greater.
13. The method of claim 12 , wherein the oxidant is selected from the group consisting of hypochlorite, hypochlorous acid, and combinations thereof.
14. The method of claim 12 , wherein the carrier is selected from the group consisting of precipitated silica, precipitated silicate, and mixtures thereof.
15. The method of claim 12 , wherein the carrier has an absorbency of 200 ppm hypochlorite solutions of greater than three.
16. The method of claim 12 , wherein the particle is contained within a vapor permeable pouch.