Method for patterning detector crystal using Q-switched laser
A semiconductor radiation detector crystal is patterned by using a Q-switched laser to selectively remove material from a surface of said semiconductor radiation detector crystal, thus producing a groove in said surface that penetrates deeper than the thickness of a diffused layer on said surface.
1. A method for patterning a semiconductor radiation detector crystal, comprising:
selectively removing material from a surface of a semiconductor radiation detector crystal comprising cadmium telluride, thus producing a groove in said surface that penetrates deeper than the thickness of a diffused layer of indium on said surface, wherein said thickness is the original thickness of said diffused layer of indium after diffusing.
2. A method according to claim 1 , comprising isolating an island of diffused material on said surface from other parts of said surface by producing a groove that constitutes a closed curve around said island of diffused material.
3. A method according to claim 2 , comprising isolating a plurality of islands of diffused material on said surface from each other, and making independent electric contacts to a number of islands so isolated, said independent electric contact being adapted to enable measuring an amount of charge collected by each of said number of islands separately.
4. A method according to claim 2 , comprising isolating a portion of diffused material on said surface from a remainder of said surface with a guard ring that comprises a groove in the form of a closed curve around said portion of diffused material on said surface.
5. A method according to claim 1 , wherein the selective removing of material is accomplished by focusing a Q-switched laser into a focal point on said surface and moving the focal point in relation to said semiconductor radiation detector crystal.
6. A method according to claim 5 , comprising:
using wet etching to remove material from a groove produced with said Q-switched laser.
7. A method according to claim 6 , comprising:
prior to using said Q-switched laser to selectively remove material from said surface, covering said surface with a resist
using said Q-switched laser to selectively remove both resist and material of said semiconductor radiation detector crystal to produce said groove, and leaving a portion of resist intact on a portion of said surface, and
utilizing said portion of resist that was left intact to protect said portion of said surface during said wet etching.
8. A method according to claim 1 , wherein the selective removing of material is accomplished by mechanically sawing off material.
9. A method according to claim 1 , comprising selectively removing material from said surface by plasma etching.
10. A method for patterning a semiconductor radiation detector crystal, comprising:
covering a surface of said semiconductor radiation detector crystal with a layer of hardened resist,
selectively removing material from said surface with a method that penetrates and removes hardened resist from those parts of said surface from which material is selectively removed, at the same time when said material is selectively removed, thus producing a groove in said surface that penetrates deeper than the thickness of a diffused layer on said surface, and
cleaning said groove with an etching method that leaves resist-covered parts of said surface unetched.
11. A method according to claim 10 , wherein said method that penetrates and removes said hardened resist is one of: focusing a Q-switched laser into a focal point on said surface and moving the focal point in relation to said semiconductor radiation detector crystal; mechanically sawing off material from said surface.