Flat panel display and method for driving the same
A flat panel display for preventing a thin film transistor from deteriorating due to voltage, static electricity, and external force, accidentally applied to a substrate, and a method for driving the same. The flat panel display includes a conductive substrate, at least one insulating layer formed on the conductive substrate, at least one thin film transistor formed on the conductive substrate, and a ground formed in a region of the conductive substrate to ground the conductive substrate. Thus, the deterioration of the thin film transistor that would be generated by voltage, static electricity, or external force, accidentally applied to the conductive substrate can be substantially prevented and the performance of the display is enhanced.
1. A method for controlling a characteristic of a flat panel display, the method comprising:
preparing a conductive substrate;
after the preparing of the conductive substrate, forming a first insulating layer comprising at least one insulating layer, and a thin film transistor on a first surface of the prepared conductive substrate;
after the preparing of the conductive substrate, forming a second insulating layer on a second surface of the prepared conductive substrate;
forming a light emitting device on the thin film transistor and electrically connected to the thin film transistor;
removing a region of at least one of the first insulating layer or the second insulating layer formed on the conductive substrate to form a bias voltage contact; and
back biasing the conductive substrate through the bias voltage contact.
2. The method as claimed in claim 1 , wherein the bias voltage contact is a ground contact to ground the conductive substrate.
3. The method as claimed in claim 1 , wherein the forming of the second insulating layer on the second surface of the prepared conductive substrate comprises forming at least one nitride film on the second surface of the prepared conductive substrate.
4. The method as claimed in claim 1 , further comprising substantially preventing noise and impurities from entering the conductive substrate by selecting a material composition of the second insulating layer formed on the second surface of the prepared conductive substrate.
5. The method as claimed in claim 4 , wherein the preventing of the noise and impurities from entering the conductive substrate comprises forming at least one nitride film as at least a portion of the second insulating layer on the second surface of the prepared conductive substrate.
6. The method as claimed in claim 1 , wherein the forming of the light emitting device comprises forming an organic light emitting device.
7. A method for controlling a characteristic of a flat panel display, the method comprising:
preparing a conductive substrate;
forming a first insulating layer comprising at least one insulating layer, and a thin film transistor on a first surface of the prepared conductive substrate;
forming a second insulating layer on a second surface of the prepared conductive substrate;
forming a light emitting device on the thin film transistor and electrically connected to the thin film transistor;
removing a region of at least one of the first insulating layer or the second insulating layer formed on the conductive substrate to form a bias voltage contact; and
back biasing the conductive substrate through the bias voltage contact,
wherein the conductive substrate comprises stainless steel, metal foil or titanium.
8. A method for controlling a characteristic of a flat panel display, the method comprising:
preparing a conductive substrate;
forming a first insulating layer comprising at least one insulating layer, and a thin film transistor on a first surface of the prepared conductive substrate;
forming a second insulating layer on a second surface of the prepared conductive substrate;
forming a light emitting device on the thin film transistor and electrically connected to the thin film transistor;
removing a region of at least one of the first insulating layer or the second insulating layer formed on the conductive substrate to form a bias voltage contact;
back biasing the conductive substrate through the bias voltage contact; and
forming a third insulating layer on the first insulating layer, wherein removing a region of the least one of the first insulating layer or the second insulating layer comprises removing a region of the first insulating layer and the third insulating layer.