IP Library › Granted Patent US 7,745,798
Granted Patent B2
US 7,745,798 · App. 11/599,404 · Granted Jun 29, 2010

Dual-phosphor flat panel radiation detector

Assignee: FUJIFILM Corporation
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Quick Facts
Patent No.
US 7,745,798
App. No.
11/599,404
Granted
Jun 29, 2010
Kind
B2
Abstract

A solid state radiation detector capable of improving the sharpness of obtained radiation images. The solid state radiation detector includes: two scintillator layers that convert irradiated radiation to light; and a solid state photodetector, disposed between the two scintillators, that detects the light converted by the two scintillator layers and converts the detected light to electrical signals. Here, the scattering length of each of the scintillators is not greater than 100 μm for the light propagating in the direction parallel to the surface of the scintillator.

Claims (14)

1. A radiation detector, comprising:

two scintillator layers that convert irradiated radiation to light; and

a solid state photodetector that detects the light converted by the two scintillator layers and converts the detected light to electrical signals, the solid state photodetector being disposed between the two scintillators,

wherein the scattering length of each of the scintillators is not greater than 100 μm for the light propagating in the direction parallel to the surface of the scintillator,

wherein the distance between the surfaces of the two scintillator layers facing each other is less than or equal to 40 μm, and

wherein the solid state photodetector comprises:

a photoconductive layer that shows conductivity by receiving the light; and

thin film transistors for outputting electrical signals, the photoconductive layer and thin film transistors being layered on top of another, or arranged in a planar fashion.

2. The radiation detector according to claim 1 , wherein the thin film transistors are thin film transistors formed on a substrate and peel transferred from the substrate.

3. The radiation detector according to claim 1 , wherein the thin film transistors are thin film transistors with the substrate, on which the thin film transistors are formed, being thinned or removed by a chemical dissolution method or a polishing method.

4. The radiation detector according to claim 1 , wherein the thin film transistors are thin film transistors formed on a substrate peelably disposed on a support and peeled off the support together with the substrate.

5. The radiation detector according to claim 1 , wherein the thin film transistors are transparent thin film transistors.

6. The radiation detector according to claim 1 , wherein the scattering length of the light scattering in a direction orthogonal to a surface of each scintillator is longer than a thickness of the each scintillator.

7. The radiation detector according to claim 1 , wherein the scattering length with respect to light of each of the scintillators that propagates in a direction parallel to the scintillators is 20 μm or less.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2007
From: TAKAHASHI, KENJI
To: FUJIFILM CORPORATION
Reel/Frame 018896/0624 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 6, 2007
From: TAKAHASHI, KENJI
To: FUJIFILM CORPORATION
Reel/Frame 019676/0031 →
Priority Claims (1)
JP 2005/329564 · Nov 15, 2005 · national
Continuity (1)
Related Publication 20100127279A1 · May 27, 2010