Fin field effect transistors including oxidation barrier layers
View Patent ↗A method of forming a fin field effect transistor on a semiconductor substrate includes forming a fin-shaped active region vertically protruding from the substrate. An oxide layer is formed on a top surface and opposing sidewalls of the fin-shaped active region. An oxidation barrier layer is formed on the opposing sidewalls of the fin-shaped active region and is planarized to a height no greater than about a height of the oxide layer to form a fin structure. The fin structure is oxidized to form a capping oxide layer on the top surface of the fin-shaped active region and to form at least one curved sidewall portion proximate the top surface of the fin-shaped active region. The oxidation barrier layer has a height sufficient to reduce oxidation on the sidewalls of the fin-shaped active region about halfway between the top surface and a base of the fin-shaped active region. Related devices are also discussed.
1. A semiconductor device, comprising:
a fin-shaped active region vertically protruding from a semiconductor substrate, the fin-shaped active region having at least one curved sidewall portion proximate an upper surface of the fin-shaped active region;
an oxide layer on opposing sidewalls of the fin-shaped active region;
a capping oxide layer on the upper surface of the fin-shaped active region, the capping oxide layer being thicker than the oxide layer; and
an oxidation barrier layer extending along opposing sidewalls of the fin-shaped active region, wherein the oxidation barrier layer has a curved upper portion proximate the upper surface of the fin-shaped active region, wherein the curved upper portion faces the opposing sidewalls of the fin-shaped active region and facilitates oxidation at the upper surface of the fin-shaped active region.
2. The device of claim 1 , wherein the oxidation barrier layer has a height sufficient to reduce oxidation on the sidewalls of the fin-shaped active region about halfway between the upper surface and a base of the fin-shaped active region.
3. The device of claim 1 , wherein the fin-shaped active region has a second curved sidewall portion proximate the base of the fin-shaped active region that is spaced apart from the at least one curved sidewall portion proximate the upper surface of the fin-shaped active region such that a width of the base of the fin-shaped active region is narrower than a width at upper portions of the fin-shaped active region.
4. The device of claim 1 , further comprising:
a gate electrode formed on the oxide layer and on the capping layer.
5. The device of claim 1 , further comprising:
a charge storage layer on the oxide layer on the sidewalls of the fin-shaped active region;
a blocking insulating layer on the charge storage layer and on the capping oxide layer; and
a gate electrode on the blocking insulating layer.
6. The device of claim 5 , wherein the charge storage layer comprises silicon nitride, polysilicon, amorphous silicon, nano-crystal, and/or quantum dot materials.
7. The device of claim 1 , further comprising:
an oxidation barrier spacer on the oxide layer formed on the sidewalls of the fin-shaped active region;
a blocking insulating layer on the oxidation barrier spacer and on the capping oxide layer; and
a gate electrode on the blocking insulating layer,
wherein the oxidation barrier spacer comprises silicon nitride.
8. The device of claim 1 , wherein the capping oxide layer has a dielectric constant lower than a nitride mask pattern.