Method of manufacturing a semiconductor device
A method of forming an insulating layer on an conductive layer; forming a first mask layer and a second mask layer on the insulating layer; forming a resist layer on the second mask layer; patterning the resist layer; patterning the second mask layer by using the resist layer as a mask; etching the first mask layer halfway through its thickness by using the resist layer and the second mask layer as a mask; removing the resist layer; etching a remaining portion of the first mask layer using the second mask layer as a mask; forming an interconnect groove by etching the insulating layer using the first mask layer as a mask; and forming an electrically conductive material into the interconnect groove, thereby forming an interconnect layer connected to the conductive layer.
1. A method of manufacturing a semiconductor device comprising:
forming an insulating layer over an electrically conductive layer;
forming a first mask layer over said insulating layer;
forming a second mask layer over said first mask layer;
forming a via which passes through said second mask layer, said first mask layer, and said insulating layer;
forming a first resist layer in such a manner as to fill said via;
forming a second resist layer over said second mask layer and said first resist layer;
patterning said second resist layer into an interconnect pattern;
etching said second mask layer by using said patterned second resist layer as a mask;
etching said first mask layer halfway through a thickness thereof by using said second resist layer and said second mask layer as a mask;
removing said first resist layer and said second resist layer;
etching away a remaining portion of said first mask layer by using said second mask layer as a mask;
forming an interconnect groove by etching said insulating layer using said first mask layer as a mask; and
forming an electrically conductive material into said via and said interconnect groove, thereby forming an interconnect layer connected to said electrically conductive layer.
2. The method according to claim 1 , wherein said first mask layer contains silicon oxide.
3. The method according to claim 2 , wherein said second mask layer includes at least one selected from the group consisting of silicon nitride and silicon carbide.
4. The method according to claim 1 , wherein a gas including CF 4 is used in at least one of said etching said first mask layer halfway through the thickness thereof and said etching away the remaining portion of said first mask layer.
5. The method according to claim 1 , wherein a gas including CF 4 and CO is used in said etching away the remaining portion of said first mask layer.
6. The method according to claim 4 , wherein said gas including CF 4 and at least one kind of gas selected from the group consisting of C 4 F 6 , C 4 F 8 , CHF 3 , CH 2 F 2 , H 2 , N 2 , O 2 , and Ar is used in at least one of said etching said first mask layer halfway through the thickness thereof and said etching away the remaining portion of said first mask layer.
7. The method according to claim 1 , further comprising forming a third mask layer before said forming said first mask layer, and wherein
in forming said first mask layer, said first mask layer is formed over said third mask layer.
8. The method according to claim 7 , wherein said forming said electrically conductive material into said via and said interconnect groove includes:
depositing said electrically conductive material over said first mask as well as into said via and said interconnect groove; and
removing said electrically conductive material lying over said first mask by chemical mechanical polishing, wherein
said first mask layer has a greater chemical mechanical polishing rate than chemical mechanical polishing rate of said third mask layer.
9. The method according to claim 7 , wherein said third mask layer includes silicon carbide.
10. The method according to claim 9 , wherein said insulating layer includes a first insulating layer formed over said electrically conductive layer and a second insulating layer formed over said first insulating layer, and wherein
said second insulating layer has a lower dielectric constant than dielectric constant of said first insulating layer.
11. The method according to claim 1 , wherein
said forming said second mask layer includes forming said second mask layer to a thickness t 1 ,
said etching said first mask layer halfway through the thickness thereof includes etching said first mask layer until the thickness of said first mask layer is reduced to t 2 , and
said etching away the remaining portion of said first mask layer includes etching said second mask layer until the thickness of said second mask layer is reduced to t 3 , and wherein
t 1 , t 2 , and t 3 satisfy the relation t 1 / 2 −t 3 / 2 <t 2 <t 1 −t 3 .
12. The method according to claim 1 , wherein
said forming said second mask layer includes forming said second mask layer to a thickness falling within a range of 23 nm to 90 nm, and
said etching said first mask layer halfway through the thickness thereof includes etching said first mask layer until the thickness of said first mask layer is reduced to within a range of 30 nm to 60 nm.
13. The method according to claim 1 , wherein a CF 4 gas with a flow rate of 1.69×10 −2 Pa·m 3 /second and a CO gas with a flow rate of 3.38×10 −2 to 5.07×10 −2 Pa·m 3 /second are used in said etching away the remaining portion of said first mask layer.